H
Hitoshi Umezawa
Researcher at National Institute of Advanced Industrial Science and Technology
Publications - 212
Citations - 4790
Hitoshi Umezawa is an academic researcher from National Institute of Advanced Industrial Science and Technology. The author has contributed to research in topics: Diamond & Schottky barrier. The author has an hindex of 35, co-authored 201 publications receiving 4214 citations. Previous affiliations of Hitoshi Umezawa include New Energy and Industrial Technology Development Organization & Centre national de la recherche scientifique.
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Journal ArticleDOI
Superconductivity in diamond thin films well above liquid helium temperature
Yoshihiko Takano,Masanori Nagao,Isao Sakaguchi,Minoru Tachiki,Takeshi Hatano,K. Kobayashi,Hitoshi Umezawa,Hiroshi Kawarada +7 more
TL;DR: In this paper, the authors reported unambiguous evidence for superconductivity in a heavily boron-doped diamond thin film grown by microwave plasma-assisted chemical vapor deposition (MPCVD).
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Superconductivity in CVD Diamond Thin Film Well-Above Liquid Helium Temperature
Yoshihiko Takano,Masanori Nagao,K. Kobayashi,Hitoshi Umezawa,Isao Sakaguchi,Masashi Tachiki,T. Hatano,Hiroshi Kawarada +7 more
TL;DR: In this paper, the onset of superconductivity in heavily boron-doped diamond synthesized by high pressure sintering was found to be 7.4K, which is higher than the reported value in ref(7) and well above helium liquid temperature.
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High temperature application of diamond power device
TL;DR: In this paper, a diamond Schottky barrier diode instead of SiC diode was used for high temperature power device applications, and the high breakdown field of more than 3mV/cm was achieved by utilizing high Schotty barrier height.
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Electrolyte-Solution-Gate FETs Using Diamond Surface for Biocompatible Ion Sensors
TL;DR: In this paper, the diamond field effect transistors have operated in electrolyte solution for the first time since the hydrogen-terminated diamond surfaces are stable enough for the use as an electrochemical electrode, the diamond surface channels are exposed to the electrolyte in the transistor structure.
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Leakage current analysis of diamond Schottky barrier diode
Hitoshi Umezawa,Takeyasu Saito,Norio Tokuda,Masahiko Ogura,Sung-Gi Ri,Hiromichi Yoshikawa,Shinichi Shikata +6 more
TL;DR: In this article, the currentvoltage characteristics of non-punch-through-type diamond Schottky barrier diodes were analyzed by using thermionic and thermionic-field emission (TFE) models.