Thermal sensors based on the seebeck effect

Microfabrication technologies initially developed for integrated electronics have been successfully applied to batch-fabricate a wide variety of micromechanical structures for sensing, actuating, or signal-processing functions such as filters. By appropriately combining the deposition, etching, and lithography steps for microelectromechanical devices with those needed for microelectronic devices, it is possible to fabricate an integrated microsystem in a single process sequence. This paper reviews the strategies for cofabrication, with an emphasis on modular approaches that do not mix the two process sequences. The integrated processes are discussed using examples of physical sensors (infrared imagers and inertial sensors), chemical and biochemical sensors, electrostatic and thermal actuators for displays and optical switching, and nonvolatile memories. By adding new functionality to integrated electronics, the use of microelectromechanical systems is opening new applications in sensing and actuating, as well as enhancing the performance of analog and digital integrated circuits.

Technologies for Cofabricating MEMS and Electronics

Calorimetric biosensors with integrated microfluidic channels.

Integrated semiconductor-on-insulator (SOI) sensors and circuits which are electrostatically bonded to a support substrate, such as glass or an oxidized silicon wafer, are disclosed. The SOI sensors and SOI circuits are both formed using a novel fabrication process which allows multiple preformed and pretested integrated circuits on a silicon wafer to be electrostatically bonded to the support substrate without exposing the sensitive active regions of the electronic devices therein to a damaging electric field. The process includes forming a composite bonding structure on top of the integrated circuits prior to the bonding step. This composite structure includes a conductive layer dielectrically isolated from the circuit devices and electrically connected to the silicon wafer, which is spaced form but laterally overlaps at least the active semiconductive regions of the circuit devices. The SOI sensors each include a transducer and at least one active electronic device, which are both made at least in part from a common layer of lightly-doped single-crystal semiconductor material grown on the silicon wafer. After the bonding step, the bulk of the single-crystal wafer is removed, leaving the epitaxial layer containing the circuits and transducers. The epitaxial layer is then patterned into isolated mesas to dielectrically isolate the electronic devices. This patterning step also exposes bond pads, allowing external connections to be readily made to the sensors and circuits. Exemplary solid-state sensors disclosed herein include a capacitive accelerometer and pressure sensor.

Fully integrated single-crystal silicon-on-insulator process, sensors and circuits

A 128/spl times/128 element bolometer infrared image sensor using thin film titanium is proposed. The device is a monolithically integrated structure with a titanium bolometer detector located over a CMOS circuit that reads out the bolometer's signals. By employing a metallic material like titanium and refining the CMOS readout circuit, it is possible to minimize 1/f noise. It is demonstrated that the use of low 1/f noise material will help increase bias current and improve the S/N ratio. Since the fabrication process is silicon-process compatible, costs can be kept low.

Infrared focal plane array incorporating silicon IC process compatible bolometer

This paper describes a new low-cost infrared detector array that has been realized using standard silicon MOS process technology and micromachining. This array uses thermopiles as infrared detecting elements and multiple layers of silicon oxide and silicon nitride for diaphragm windows measuring 0.4 mm × 0.7 mm × 1.3 µm. Each thermopile consists of 40 polysilicon-gold thermocouples. A high fill factor for this array structure has been achieved by using the boron etch-stop technique to provide 20-µm thick silicon support rims. The array shows a response time of less than 10 ms, a responsivity of 12 V/ W; and a broad-band input spectral sensitivity. The process is compatible with silicon MOS devices, and a 16 × 2 staggered array with on-chip multiplexers has been designed for applications in process monitoring. The array theoretically achieves an NETD of 0.9°C and an MRTD of 1.4°C at a spatial frequency of 0.2 Hz/mrad in a typical imaging system.

A silicon-thermopile-based infrared sensing array for use in automated manufacturing

This paper describes a new low-cost infrared detector array that has been realized using standard silicon MOS process technology and micromachining. This array uses thermopiles as infrared detecting elements and multiple layers of silicon oxide and silicon nitride for diaphragm windows measuring 0.4 mm x 0.7 mm x 1.3 μm. Each thermopile consists of 40 polysilicon-gold thermocouples. A high fill factor for this array structure has been achieved by using the boron etch-stop technique to provide 20-μm thick silicon support rims. The array shows a response time of less than 10 ms, a responsivity of 12 V/ W, and a broad-band input spectral sensitivity. The process is compatible with silicon MOS devices, and a 16 x 2 staggered array with on-chip multiplexers has been designed for applications in process monitoring. The array theoretically achieves an NETD of 0.9°C and an MRTD of 1.4°C at a spatial frequency of 0.2 Hz/mrad in a typical imaging system.

Il Hyun Choi

Papers

A silicon-thermopile-based infrared sensing array for use in automated manufacturing

A silicon-thermopile-based infrared sensing array for use in automated manufacturing