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J. Levoska

Researcher at University of Oulu

Publications -  95
Citations -  1271

J. Levoska is an academic researcher from University of Oulu. The author has contributed to research in topics: Thin film & Dielectric. The author has an hindex of 18, co-authored 94 publications receiving 1237 citations.

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Thermal oxidation of porous silicon: Study on structure

TL;DR: In this article, the structural changes of porous silicon samples during oxidation are investigated and analyzed using various microscopy techniques and x-ray diffraction, and it is found that the surface roughness of oxidized porous silicon layers increases with the oxidation at 200-400°C and decreases at 600-800°C.
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Dielectric anomalies in epitaxial films of relaxor ferroelectric (PbMg 1/3 Nb 2/3 O 3 ) 0.68 -(PbTiO 3 ) 0.32

TL;DR: In this paper, it was shown that an apparent relaxorlike behavior in ferroelectric thin film heterostructures, evidenced only by a broad maximum and frequency dispersion of the dielectric permittivity, can be determined by the film-electrode interface rather than by the relaxor properties of the films.
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Tribological characterization of carbon-nitrogen coatings deposited by using vacuum arc discharge

TL;DR: In this article, carbon nitride (CN) films have been deposited by using the pulsed vacuum arc method on silicon and metallic substrates, and the wear and friction properties of the CN films as a function of nitrogen content were measured by using a pin-on-disk apparatus.
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Relaxation of induced polar state in relaxor PbMg1∕3Nb2∕3O3 thin films studied by piezoresponse force microscopy

TL;DR: In this paper, a piezoelectric signal obeying a Kohlrausch-Williams-Watt dependence was observed in epitaxial thin films of relaxor ferroelectric PbMg1 ∕3Nb2∕3O3 (PMN).
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Relaxor behavior of pulsed laser deposited ferroelectric (Pb1−xLax)(Zr0.65Ti0.35)O3 films

TL;DR: In this article, the dielectric behavior of pulsed laser deposited ferroelectric (Pb1−xLax)(Zr0.65Ti0.35)O3 films (PLZT x/65/35, x=0-9.75