J
James J. Coleman
Researcher at University of Texas at Arlington
Publications - 7
Citations - 188
James J. Coleman is an academic researcher from University of Texas at Arlington. The author has contributed to research in topics: Isotropic etching & Etching (microfabrication). The author has an hindex of 5, co-authored 7 publications receiving 120 citations. Previous affiliations of James J. Coleman include University of Texas at Dallas.
Papers
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Journal ArticleDOI
Semiconductor quantum dots
Weidong Zhou,James J. Coleman +1 more
TL;DR: A short review of recent advances in the areas of quantum dots for computing and communications, solid state lighting, photovoltaics, and biomedical applications can be found in this article.
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CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures.
TL;DR: Vapor Phase MacEtch represents a significant step towards scalability of this disruptive technology because of the high controllability of gas phase reaction dynamics and may also have direct implications in embedded TiN-based plasmonic semiconductor structures for photonic applications.
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Self-Anchored Catalyst Interface Enables Ordered Via Array Formation from Submicrometer to Millimeter Scale for Polycrystalline and Single-Crystalline Silicon
Jeong Dong Kim,Munho Kim,Lingyu Kong,Parsian K. Mohseni,Srikanth Ranganathan,Jayavel Pachamuthu,Wai Kin Chim,Sing Yang Chiam,James J. Coleman,Xiuling Li,Xiuling Li +10 more
TL;DR: The ability of SAC-MacEtch to etch through poly/oxide/poly stack as well as more than half millimeter thick silicon with excellent site specificity for a wide range of feature sizes has significant implications for 2.5D/3D photonic and electronic device applications.
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Scaling the Aspect Ratio of Nanoscale Closely Packed Silicon Vias by MacEtch: Kinetics of Carrier Generation and Mass Transport
Jeong Dong Kim,Parsian K. Mohseni,Parsian K. Mohseni,Karthik Balasundaram,Srikanth Ranganathan,Jayavel Pachamuthu,James J. Coleman,Xiuling Li,Xiuling Li +8 more
TL;DR: In this article, the authors reported the realization of ordered, vertical, and high aspect ratio silicon via arrays by MacEtch, with diameters scaled from 900 all the way down to sub-100 nm.
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Polarization-independent one-dimensional grating coupler design on hybrid silicon/LNOI platform
TL;DR: Detailed modal and loss analysis suggest different dominant loss mechanisms in the proposed hybrid structure, where the introduction of the bottom mirror may not result in significant improvement in coupling efficiency, as the dominant loss mechanism arises from the top reflection loss.