J
Jin-Ki Jung
Researcher at SK Hynix
Publications - 20
Citations - 216
Jin-Ki Jung is an academic researcher from SK Hynix. The author has contributed to research in topics: Layer (electronics) & Etching (microfabrication). The author has an hindex of 8, co-authored 20 publications receiving 216 citations.
Papers
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Proceedings ArticleDOI
Positive and negative tone double patterning lithography for 50nm flash memory
Chang-Moon Lim,Seo-Min Kim,Young-Sun Hwang,Jaeseung Choi,Keundo Ban,Sung-Yoon Cho,Jin-Ki Jung,Eung-Kil Kang,Hee-Youl Lim,Hyeong-Soo Kim,Seung-Chan Moon +10 more
TL;DR: In this article, various issues in double patterning lithography such as pattern decomposition, resist process on patterned topography, process window of 1/4 pitch patterning, and overlay dependent CD variation are studied on positive and negative tone double patterns respectively.
Patent
Phase-change memory device and method of fabricating the same
TL;DR: A phase-change memory device includes a lower electrode; and at least two phase change memory cells sharing the lower electrode as discussed by the authors, and a heating layer having a smaller contact area with a phase change material layer and a greater contact area having a PN diode structure.
Patent
Method for forming magnetic tunnel junction cell
TL;DR: In this article, a method for forming a magnetic tunnel junction cell includes forming a pinning, a pinned layer, a dielectric layer and a free layer over a first electrode, forming a second electrode on the free layer, etching the pinned layer and the pinning layer using the second electrode and the prevention layer as an etch barrier to form a second pattern.
Patent
Method for fabricating fine pattern in semiconductor device
TL;DR: In this article, a method for fabricating a fine pattern in a semiconductor device includes forming a first photoresist over a substrate where an etch target layer is formed.
Patent
Method for fabricating semiconductor device using tungsten as sacrificial hard mask
Kwang-Ok Kim,Yun-Seok Cho,Seung-Chan Moon,Jin-Ki Jung,Sung-Kwon Lee,Jun-Hyeub Sun,Dong-Duk Lee,Jinwoong Kim,Gyu-Han Yoon +8 more
TL;DR: In this paper, a method for fabricating a semiconductor device using tungsten as a sacrificial hard mask material was proposed, which includes the steps of: forming a layer on an etch target layer; forming a photoresist pattern on the layer; etching the layer by using the photoresists pattern as an etChF 3 mask along with use of a plasma containing CHF 3 gas.