J
Jincheng Zhang
Researcher at Xidian University
Publications - 695
Citations - 10589
Jincheng Zhang is an academic researcher from Xidian University. The author has contributed to research in topics: Perovskite (structure) & Breakdown voltage. The author has an hindex of 36, co-authored 575 publications receiving 6336 citations.
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Journal ArticleDOI
A simple and efficient solar cell parameter extraction method from a single current-voltage curve
TL;DR: In this paper, a simple and efficient method for the extraction of all the parameters of a solar cell from a single current-voltage (I-V) curve under the constant illumination level is proposed.
Journal ArticleDOI
Intermolecular Exchange Boosts Efficiency of Air-Stable, Carbon-Based All-Inorganic Planar CsPbIBr2 Perovskite Solar Cells to Over 9%
Weidong Zhu,Qianni Zhang,Dazheng Chen,Zeyang Zhang,Zhenhua Lin,Jingjing Chang,Jincheng Zhang,Chunfu Zhang,Yue Hao +8 more
Journal ArticleDOI
NiO/Perovskite Heterojunction Contact Engineering for Highly Efficient and Stable Perovskite Solar Cells
Bingjuan Zhang,Jie Su,Xing Guo,Long Zhou,Long Zhou,Zhenhua Lin,Liping Feng,Jincheng Zhang,Jingjing Chang,Yue Hao +9 more
TL;DR: A CsBr buffer layer is inserted between NiOx hole transport layer and perovskite layer to relieve the lattice mismatch induced interface stress and induce more ordered crystal growth and improve the device stability.
Proceedings ArticleDOI
Ferroelectric HfZrO x Ge and GeSn PMOSFETs with Sub-60 mV/decade subthreshold swing, negligible hysteresis, and improved I ds
Jiuren Zhou,Genquan Han,Qinglong Li,Yue Peng,Xiaoli Lu,Chunfu Zhang,Jincheng Zhang,Qing-Qing Sun,David Wei Zhang,Yue Hao +9 more
TL;DR: In this paper, the authors reported the first ferroelectric (FE) HfZrO x (HZO) Ge and GeSn pMOSFETs with sub-60 mV/decade subthreshold swing (SS) and negligible hysteresis.
Journal ArticleDOI
AlGaN/GaN MOS-HEMT With $\hbox{HfO}_{2}$ Dielectric and $\hbox{Al}_{2}\hbox{O}_{3}$ Interfacial Passivation Layer Grown by Atomic Layer Deposition
TL;DR: In this article, a stack gate HfO2/Al2O3 structure grown by atomic layer deposition was used for high-electron mobility transistors with 1- mum gate lengths.