We present a comprehensive, up-to-date compilation of band parameters for the technologically important III–V zinc blende and wurtzite compound semiconductors: GaAs, GaSb, GaP, GaN, AlAs, AlSb, AlP, AlN, InAs, InSb, InP, and InN, along with their ternary and quaternary alloys. Based on a review of the existing literature, complete and consistent parameter sets are given for all materials. Emphasizing the quantities required for band structure calculations, we tabulate the direct and indirect energy gaps, spin-orbit, and crystal-field splittings, alloy bowing parameters, effective masses for electrons, heavy, light, and split-off holes, Luttinger parameters, interband momentum matrix elements, and deformation potentials, including temperature and alloy-composition dependences where available. Heterostructure band offsets are also given, on an absolute scale that allows any material to be aligned relative to any other.

Band parameters for III–V compound semiconductors and their alloys

羟氨苄青霉素引起大疱性类天疱疮样疹

Recent technical advances in the atomic-scale synthesis of oxide heterostructures have provided a fertile new ground for creating novel states at their interfaces. Different symmetry constraints can be used to design structures exhibiting phenomena not found in the bulk constituents. A characteristic feature is the reconstruction of the charge, spin and orbital states at interfaces on the nanometre scale. Examples such as interface superconductivity, magneto-electric coupling, and the quantum Hall effect in oxide heterostructures are representative of the scientific and technological opportunities in this rapidly emerging field.

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Emergent phenomena at oxide interfaces

Electro-optic modulators translate high-speed electronic signals into the optical domain and are critical components in modern telecommunication networks1,2 and microwave-photonic systems3,4. They are also expected to be building blocks for emerging applications such as quantum photonics5,6 and non-reciprocal optics7,8. All of these applications require chip-scale electro-optic modulators that operate at voltages compatible with complementary metal–oxide–semiconductor (CMOS) technology, have ultra-high electro-optic bandwidths and feature very low optical losses. Integrated modulator platforms based on materials such as silicon, indium phosphide or polymers have not yet been able to meet these requirements simultaneously because of the intrinsic limitations of the materials used. On the other hand, lithium niobate electro-optic modulators, the workhorse of the optoelectronic industry for decades9, have been challenging to integrate on-chip because of difficulties in microstructuring lithium niobate. The current generation of lithium niobate modulators are bulky, expensive, limited in bandwidth and require high drive voltages, and thus are unable to reach the full potential of the material. Here we overcome these limitations and demonstrate monolithically integrated lithium niobate electro-optic modulators that feature a CMOS-compatible drive voltage, support data rates up to 210 gigabits per second and show an on-chip optical loss of less than 0.5 decibels. We achieve this by engineering the microwave and photonic circuits to achieve high electro-optical efficiencies, ultra-low optical losses and group-velocity matching simultaneously. Our scalable modulator devices could provide cost-effective, low-power and ultra-high-speed solutions for next-generation optical communication networks and microwave photonic systems. Furthermore, our approach could lead to large-scale ultra-low-loss photonic circuits that are reconfigurable on a picosecond timescale, enabling a wide range of quantum and classical applications5,10,11 including feed-forward photonic quantum computation. Chip-scale lithium niobate electro-optic modulators that rapidly convert electrical to optical signals and use CMOS-compatible voltages could prove useful in optical communication networks, microwave photonic systems and photonic computation.

Integrated lithium niobate electro-optic modulators operating at CMOS-compatible voltages

First-principles band theory, properly augmented by topological considerations, has provided a remarkably successful framework for predicting new classes of topological materials. This Colloquium discusses the underpinnings of the topological band theory and its materials applications.

Colloquium : Topological band theory

A major challenge to increasing bandwidth in optical telecommunications is to encode electronic signals onto a lightwave carrier by modulating the light up to very fast rates Polymer electro-optic materials have the necessary properties to function in photonic devices beyond the 40-GHz bandwidth currently available An appropriate choice of polymers is shown to effectively eliminate the factors contributing to an optical modulator's decay in the high-frequency response The resulting device modulates light with a bandwidth of 150 to 200 GHz and produces detectable modulation signal at 16 THz These rates are faster than anticipated bandwidth requirements for the foreseeable future

https://science.sciencemag.org/content/sci/298/5597/1401.full.pdf

Broadband Modulation of Light by Using an Electro-Optic Polymer

Thin films of oxygen-bearing compounds could have myriad practical applications, finds Joerg Heber, if a few problems can be overcome.

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Materials science: Enter the oxides

We report on a comparative study of room temperature intersubband electron scattering lifetimes in GaN/AlGaN single and coupled double multiple quantum well (QW) samples with peak absorption wavelengths ranging from 1.4 to 1.7 μm. Using time-resolved pump-probe spectroscopy electron scattering times as short as ∼160 fs have been measured for a coupled QW sample and ≲300 fs for single QW samples. While no significant dependence on the excitation power has been observed, a decrease of the scattering times with increasing probe wavelength has been measured and may be attributed to monolayer fluctuations in the samples.

Comparative study of ultrafast intersubband electron scattering times at ̃1.55 μm wavelength in GaN/AlGaN heterostructures

Small oscillations of surface electrons that manipulate light on the nanoscale could be the route to applications as disparate as faster computer chips and cures for cancer. Joerg Heber reports.

/pdf/plasmonics-surfing-the-wave-4s63e0wukq.pdf

Plasmonics: Surfing the wave

Negative luminescence operation is reported for p–n diode devices with type-II InAs/InAsSb strained-layer-superlattice active regions which have a spectral peak at 4.2 μm and a negative luminescence efficiency of up to 20%.

Joerg Heber

Papers

Broadband Modulation of Light by Using an Electro-Optic Polymer

Materials science: Enter the oxides

Comparative study of ultrafast intersubband electron scattering times at ̃1.55 μm wavelength in GaN/AlGaN heterostructures

Plasmonics: Surfing the wave

Type-II InAs/InAsSb strained-layer-superlattice negative luminescence devices