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Joost Conrad Lötters

Researcher at MESA+ Institute for Nanotechnology

Publications -  148
Citations -  2342

Joost Conrad Lötters is an academic researcher from MESA+ Institute for Nanotechnology. The author has contributed to research in topics: Flow measurement & Mass flow sensor. The author has an hindex of 15, co-authored 134 publications receiving 2130 citations. Previous affiliations of Joost Conrad Lötters include University of Twente.

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The mechanical properties of the rubber elastic polymer polydimethylsiloxane for sensor applications

TL;DR: Polydimethylsiloxane (PDMS) is a commercially available physically and chemically stable silicone rubber as mentioned in this paper, which has a unique flexibility with a shear elastic modulus due to one of the lowest glass transition temperatures of any polymer.
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Standing balance evaluation using a triaxial accelerometer

TL;DR: Paired t-tests indicated that the accelerometer measurements were able to distinguish between the different test conditions as well as or better than simultaneous AMTI force platform measurements (P < or = 0.05).
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Procedure for in-use calibration of triaxial accelerometers in medical applications

TL;DR: In this paper, a calibration procedure for triaxial accelerometers is proposed, which uses the fact that the modulus of the acceleration vector measured with a triaxis accelerometer equals 1g under quasi-static conditions.
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A sensitive differential capacitance to voltage converter for sensor applications

TL;DR: The CVC proposed is based on a symmetrical structure containing two half ac bridges, is intrinsically immune to parasitic capacitances and resistances, is capable of detecting capacitance changes from dc up to at least 10 kHz, is able to handle both single and differential capacitance, and can easily be realized with discrete components.
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Modeling, design, fabrication and characterization of a micro Coriolis mass flow sensor

TL;DR: In this paper, a micromachined Coriolis mass flow sensor was designed and realized using semi-circular channels just beneath the surface of a silicon wafer, which have thin silicon nitride walls to minimize the channel mass with respect to the mass of moving fluid.