J
Joshua J. Krueger
Researcher at IBM
Publications - 3
Citations - 212
Joshua J. Krueger is an academic researcher from IBM. The author has contributed to research in topics: Photolithography & Die preparation. The author has an hindex of 3, co-authored 3 publications receiving 212 citations.
Papers
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Proceedings ArticleDOI
Optimizing style options for subresolution assist features
Lars W. Liebmann,James A. Bruce,William M. Chu,Michael Cross,Ioana Graur,Joshua J. Krueger,William C. Leipold,Scott M. Mansfield,Anne E. McGuire,Dianne L. Sundling +9 more
TL;DR: In this article, the authors present the optimization of SRAF style options that specify how SRAFs are to behave in realistic two-dimensional circuit layouts, based on the work done to strike the correct balance between sraf manufacturability, CAD turnaround time and lithographic benefit.
Patent
Mask defect analysis system
James A. Bruce,Orest Bula,Edward W. Conrad,William C. Leipold,Michael S. Hibbs,Joshua J. Krueger +5 more
TL;DR: In this article, an automated system for analyzing mask defects in a semiconductor manufacturing process is presented, which combines results from an inspection tool and design layout data from a design data repository corresponding to each mask layer being inspected with a computer program and a predetermined rule set to determine when a defect on a given mask layer has occurred.
Patent
Mask/wafer control structure and algorithm for placement
TL;DR: In this paper, a mask/wafer control structure and an algorithm for placement thereof provide for data placement of measurement control structures, called a PLS, Process limiting Structure, on a mask and a plurality of chips on the wafer which provide for tighter control of both mask manufacture and wafer production.