Patent
Mask defect analysis system
James A. Bruce,Orest Bula,Edward W. Conrad,William C. Leipold,Michael S. Hibbs,Joshua J. Krueger +5 more
TLDR
In this article, an automated system for analyzing mask defects in a semiconductor manufacturing process is presented, which combines results from an inspection tool and design layout data from a design data repository corresponding to each mask layer being inspected with a computer program and a predetermined rule set to determine when a defect on a given mask layer has occurred.Abstract:
An automated system for analyzing mask defects in a semiconductor manufacturing process is presented. This system combines results from an inspection tool and design layout data from a design data repository corresponding to each mask layer being inspected with a computer program and a predetermined rule set to determine when a defect on a given mask layer has occurred. Mask inspection results include the presence, location and type (clear or opaque) of defects. Ultimately, a determination is made as to whether to scrap, repair or accept a given mask based on whether the defect would be likely to cause product failure. Application of the defect inspection data to the design layout data for each mask layer being inspected prevents otherwise acceptable wafer masks from being scrapped when the identified defects are not in critical areas of the mask.read more
Citations
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Patent
Methods and systems for utilizing design data in combination with inspection data
TL;DR: In this paper, a computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space.
Patent
Methods and systems for determining a position of inspection data in design data space
TL;DR: In this paper, a computer-implemented method for determining a centroid of an alignment target formed on a wafer using an image of the alignment target acquired by imaging the wafer is presented.
Patent
Methods and systems for detecting defects in a reticle design pattern
Ingrid B. Peterson,Ed Yum +1 more
TL;DR: In this paper, computer-implemented methods and systems for detecting defects in a reticle design pattern are provided, which illustrate how the reticle pattern will be projected on a wafer by the exposure system at different values of one or more parameters of the wafer printing process.
Patent
Systems and methods for creating inspection recipes
Brian Duffy,Ashok Kulkarni +1 more
TL;DR: One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process.
Patent
Visual analysis and verification system using advanced tools
TL;DR: In this paper, a system and method of analyzing defects on a mask used in lithography is presented, where a defect area image is provided as a first input, a set of lithography parameters is used as a second input, and metrology data is provided by a third input.
References
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Patent
Automated defect classification system
Virginia H. Brecher,B.-L Chou Paul,Robert W. Hall,Debra M. Parisi,Ravishankar Rao,Stuart L. Riley,Martin C. Sturzenbecker +6 more
TL;DR: In this paper, an integrated visual defect detection and classification system is presented, which includes adaptive defect detection, image labeling, defect feature measures, and a knowledge based inference shell/engine for classification based on fuzzy logic.
Patent
Inspection technique of photomask
Christophe Pierrat,James Burdorf +1 more
TL;DR: In this paper, an improved technique for inspecting photomasks employs simulated images of the resist pattern, compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern.
Patent
Visual inspection and verification system
TL;DR: In this paper, a method and apparatus for inspecting a photolithography mask for defects is provided, which consists of providing a defect area image to an image simulator wherein the defect image is an image of a portion of a photochemical mask, and providing a set of lithography parameters as a second input to the image simulator.
Patent
System and method of providing mask defect printability analysis
TL;DR: In this article, a simulated wafer image of a physical mask and a defect-free reference image are used to generate a severity score for each defect, thereby giving a customer meaningful information to accurately assess the consequences of using a mask or repairing that mask.
Patent
Mechanisms for making and inspecting reticles
TL;DR: In this article, a reusable circuit design for use with electronic design automation tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuits.