K
Karl D. Hirschman
Researcher at Rochester Institute of Technology
Publications - 94
Citations - 2512
Karl D. Hirschman is an academic researcher from Rochester Institute of Technology. The author has contributed to research in topics: Silicon & Porous silicon. The author has an hindex of 19, co-authored 90 publications receiving 2453 citations. Previous affiliations of Karl D. Hirschman include University of Rochester.
Papers
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Journal ArticleDOI
Silicon-based visible light-emitting devices integrated into microelectronic circuits
Karl D. Hirschman,Karl D. Hirschman,Leonid Tsybeskov,Siddhartha P. Duttagupta,Philippe M. Fauchet,Philippe M. Fauchet +5 more
TL;DR: In this article, the authors demonstrate the successful integration of silicon-based visible light-emitting devices into a standard bipolar microelectronic circuit by exploiting the thermal and chemical stability of porous silicon.
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Nanocrystalline-silicon superlattice produced by controlled recrystallization
Leonid Tsybeskov,Karl D. Hirschman,Siddhartha P. Duttagupta,Margit Zacharias,Philippe M. Fauchet,John P. McCaffrey,David J. Lockwood +6 more
TL;DR: In this paper, the size of the Si nanocrystals is limited by the thickness of the a-Si layer, the shape is nearly spherical, and the orientation is random.
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Thermal crystallization of amorphous Si/SiO2 superlattices
Margit Zacharias,Jürgen Bläsing,Peter Veit,Leonid Tsybeskov,Karl D. Hirschman,Philippe M. Fauchet +5 more
TL;DR: In this article, an empirical model that takes into account the Si layer thickness, the Si/SiO2 interface range, and a material specific constant has been developed, and the origin of the strain in the crystallized structure is discussed.
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Stable and efficient electroluminescence from a porous silicon‐based bipolar device
TL;DR: A complete process compatible with conventional Si technology has been developed in order to produce a bipolar light-emitting device as mentioned in this paper, which consists of a layer of light emitting porous silicon annealed at high temperature (800-900 C) sandwiched between a p-type Si wafer and a highly doped polycrystalline Si film.
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A Three‐Dimensional Porous Silicon p–n Diode for Betavoltaics and Photovoltaics
TL;DR: In this article, a 3D porous silicon p±n diode was constructed to form the basis of a novel be-tavoltaic battery using tritium to demonstrate the proof-of-concept, the 3D diode geometry demonstrated a tenfold enhancement of efficiency compared to that of the usual 2D planar diode structure.