K
Kenneth R. Shull
Researcher at Northwestern University
Publications - 223
Citations - 11802
Kenneth R. Shull is an academic researcher from Northwestern University. The author has contributed to research in topics: Polymer & Copolymer. The author has an hindex of 56, co-authored 212 publications receiving 10828 citations. Previous affiliations of Kenneth R. Shull include IBM & University of Pennsylvania.
Papers
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Journal ArticleDOI
Viscoelastic properties of electrochemically deposited protein/metal complexes.
TL;DR: A method was developed to characterize the viscoelastic properties of thin films in liquid media using the QCM as a high-frequency rheometer and data imply that the gels are composed of a weakly cross-linked proteinaceous network with properties similar to albumin solutions with concentrations in the range of ≈40 wt %.
Journal Article
Contact Mechanics Studies with the Quartz Crystal Microbalance
TL;DR: In this paper, a contact mechanics methodology utilizing the quartz crystal microbalance (QCM) has been applied to study the spreading behavior of polymer solutions and gels, where changes in the resonant frequency and in the dissipation are monitored as these materials are brought into contact with the electrode surface of the QCM.
Journal ArticleDOI
High-Toughness Polycation Cross-Linked Triblock Copolymer Hydrogels
Yaoyao Chen,Kenneth R. Shull +1 more
TL;DR: In this paper, a partially quaternized poly(4-vinylpyridine) (QVP) is introduced into the system to provide an energy dissipation mechanism with fracture energies in excess of 1000 J/m2 obtained in some cases.
Patent
Modified Acrylic Block Copolymers For Hydrogels and Pressure Sensitive Wet Adhesives
TL;DR: In this paper, a method of producing an acrylic block copolymer comprising hydrophobic poly (lower alkyl methoacrylate), hydrophilic poly, lower alkyls methacrylic acid, and hydrophobiotic poly was proposed.
Journal ArticleDOI
Nanoscale impedance microscopy-a characterization tool for nanoelectronic devices and circuits
TL;DR: In this paper, a recently developed conductive atomic force microscopy (cAFM) technique, nanoscale impedance microscopy, is presented as a characterization strategy for nanoelectronic devices and circuits.