K
Kerstin Worhoff
Researcher at MESA+ Institute for Nanotechnology
Publications - 186
Citations - 3213
Kerstin Worhoff is an academic researcher from MESA+ Institute for Nanotechnology. The author has contributed to research in topics: Laser & Waveguide (optics). The author has an hindex of 28, co-authored 186 publications receiving 2893 citations.
Papers
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Proceedings Article
Low threshold channel waveguide laser in a monocrystalline Nd:(Gd,Lu)2O3 film
A. Kahn,Henning Kühn,S. Heinrich,Klaus Petermann,G. Huber,Jonathan D. B. Bradley,Kerstin Worhoff,Markus Pollnau +7 more
TL;DR: In this article, the first waveguide laser based on rare-earth sesquioxides was reported, and the laser threshold was 0.08 µm, the preliminary slope efficiency 0.5 % and the maximum output power 1.8 mW.
Proceedings ArticleDOI
2.0 dB/cm gain in an Al 2 O 3 :Er 3+ waveguide on silicon
TL;DR: Er concentration, energy transfer upconversion and gain were investigated in Er-doped aluminum oxide channel waveguides in this article, demonstrating this material to provide a competitive active integrated optics technology.
Proceedings ArticleDOI
Phase matched second harmonic generation in silicon [Oxy]nitride-calix[4]arene waveguides
TL;DR: In this paper, the authors showed that embedded channel waveguides can be fabricated by direct electron beam writing and low optical loss can be achieved by controlling conditions appropriately, and they showed that the optical loss decreases with increasing core width for TM polarized incident light.
Proceedings Article
Reactively co-sputtered Al2O3:Er3+ for active photonic devices
TL;DR: In this article, reactive co-sputtering has been applied as a low-cost method for deposition of Er3+-doped $Al 2O_3:Er^{3+}$ layers.
Proceedings Article
Fabrication of low optical losses Al2O3 layer used for Er3+-doped integrated optical amplifiers
TL;DR: In this paper, a Graeco-Latin square is used in DC reactive magnetron sputtering deposition experiment in order to get low optical losses Al2O3 layer and an optimal combination of deposition parameters is obtained via statistic analysis with the fewest experimental runs.