K
Klaus Wittmaack
Researcher at IBM
Publications - 195
Citations - 5207
Klaus Wittmaack is an academic researcher from IBM. The author has contributed to research in topics: Ion & Secondary ion mass spectrometry. The author has an hindex of 40, co-authored 195 publications receiving 5082 citations. Previous affiliations of Klaus Wittmaack include Ludwig Maximilian University of Munich & Technical University of Berlin.
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In search of the most relevant parameter for quantifying lung inflammatory response to nanoparticle exposure: particle number, surface area, or what?
TL;DR: The analysis suggests that the physical characterization of nanoparticles and the methods to determine surface toxicity have to be improved significantly before the appropriate dose metric for lung inflammation can be identified safely.
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Elemental composition and sources of fine and ultrafine ambient particles in Erfurt, Germany.
Josef Cyrys,Matthias Stölzel,Joachim Heinrich,Wolfgang G. Kreyling,N. Menzel,Klaus Wittmaack,Thomas Tuch,H.-Erich Wichmann +7 more
TL;DR: The strong correlation of particle number concentrations with NO, which is considered to be typically emitted by traffic, and the striking similarity of their diurnal variation suggest that a sizable fraction of the particle number concentration is associated with emission from vehicles.
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Beam-induced broadening effects in sputter depth profiling
TL;DR: In this paper, the broadening effects encountered in sputter depth profiling are reviewed in some detail, focusing on cases where beam-induced microtopographical changes are of negligible importance.
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Oxygen-concentration dependence of secondary ion yield enhancement
TL;DR: In this article, the effect of implanted oxygen on secondary ion intensities has been investigated quantitatively for the first time, and it was found that at low oxygen concentrations, c o ⩽ 3 at %, the oxygen-induced signals are directly proportional to c O, whereas above that limit a power law is observed (power up to 3.7).
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Secondary ion mass spectrometry as a means of surface analysis
TL;DR: In this paper, the authors reviewed the current state of secondary ion mass spectrometry (SIMS) applied to the investigation of surfaces and discussed the basic phenomena involved (ion penetration and reflection, ion ranges and sputtering).