K
Kok Keong Lew
Researcher at United States Naval Research Laboratory
Publications - 61
Citations - 2690
Kok Keong Lew is an academic researcher from United States Naval Research Laboratory. The author has contributed to research in topics: Nanowire & Silicon. The author has an hindex of 24, co-authored 61 publications receiving 2585 citations. Previous affiliations of Kok Keong Lew include Pennsylvania State University & United States Department of the Navy.
Papers
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Journal ArticleDOI
Bottom-up assembly of large-area nanowire resonator arrays
Mingwei Li,Rustom B. Bhiladvala,Thomas J. Morrow,James A. Sioss,Kok Keong Lew,Kok Keong Lew,Joan M. Redwing,Christine D. Keating,Theresa S. Mayer +8 more
TL;DR: Bottom-up nanowire assembly can offer a practical alternative to top-down fabrication for sensitive chip-based detection and is introduced to fabricate large-area nanoelectromechanical arrays each having over 2,000 single-nanowire resonators.
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Silicon Nanowire Array Photoelectrochemical Cells
TL;DR: P-Si nanowire arrays grown in the same manner on Si(111)/Au substrates could be controllably doped p-type by addition of trimethylboron and gave a photovoltage of 220 mV in [Ru(bpy)3]2+ solution when illuminated by white light.
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Growth characteristics of silicon nanowires synthesized by vapor–liquid–solid growth in nanoporous alumina templates
Kok Keong Lew,Joan M. Redwing +1 more
TL;DR: In this paper, an investigation of the growth characteristics of Si nanowires over a temperature range from 400°C to 600°C, and over a SiH 4 partial pressure range from 0.13 to 0.65 Torr was carried out.
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Diameter dependent growth rate and interfacial abruptness in vapor-liquid-solid Si/Si1-xGex heterostructure nanowires
TL;DR: A strong diameter dependence is observed in the interfacial abruptness and growth rates in Si/Si 1- x Ge x axial heterostructure nanowires grown via Au-mediated low pressure CVD using silane and germane precursors, which may reveal a fundamental challenge to fabrication of abrupt heterostructures via VLS growth.
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Use of phosphine as an n-type dopant source for vapor-liquid-solid growth of silicon nanowires.
Yanfeng Wang,Kok Keong Lew,Tsung Ta Ho,Ling Pan,Steven W. Novak,Elizabeth C. Dickey,Joan M. Redwing,Theresa S. Mayer +7 more
TL;DR: Results demonstrate that PH3 can be used to produce n-type SiNWs with properties that are suitable for electronic and optoelectronic device applications.