scispace - formally typeset
K

Kornelius Tetzner

Researcher at Ferdinand-Braun-Institut

Publications -  35
Citations -  638

Kornelius Tetzner is an academic researcher from Ferdinand-Braun-Institut. The author has contributed to research in topics: Chemistry & Electron mobility. The author has an hindex of 12, co-authored 28 publications receiving 382 citations. Previous affiliations of Kornelius Tetzner include Technical University of Berlin & Imperial College London.

Papers
More filters
Journal ArticleDOI

Lateral 1.8 kV $\beta$ -Ga 2 O 3 MOSFET With 155 MW/cm 2 Power Figure of Merit

TL;DR: In this paper, a Ga2O3 MOSFET for power switching applications with a 1.8 kV breakdown voltage and a record power figure of merit of 155 MW/cm2 is demonstrated.
Journal ArticleDOI

Modulation‐Doped In2O3/ZnO Heterojunction Transistors Processed from Solution

TL;DR: It is shown that addition of Li in ZnO leads to n-type doping and allows for the accurate tuning of its Fermi energy and significant enhancement in both the electron mobility and TFT bias stability is demonstrated.
Journal ArticleDOI

Recent Progress in Photonic Processing of Metal-Oxide Transistors

TL;DR: A review of recent advances in photonic processing paradigms of metal oxide thin film transistors (TFTs), with particular emphasis on the use of various light source technologies for the photochemical and thermochemical conversion of precursor materials or post-deposition treatment of metal oxides and their application in thin-film electronics is presented in this article.
Journal ArticleDOI

A novel laboratory-based hard X-ray photoelectron spectroscopy system

TL;DR: A new laboratory-based instrument capable of delivering monochromated X-rays with an energy of 9.25 keV and a microfocused 30 × 45 μm2 X-ray spot is introduced that allows stable measurements under grazing incidence conditions to maximise signal intensities.
Journal ArticleDOI

Photonic curing of sol–gel derived HfO2 dielectrics for organic field-effect transistors

TL;DR: In this article, a photonic curing technique is presented for the annealing of sol-gel derived hafnium oxide (HfO 2 ) dielectrics within a few seconds.