Lei Wu

TL;DR: In this study, ultrathin a-Si was found to act as a mask against etching in HF/HNO3 mixtures, resulting in the formation of protrusive hillocks, and the proposed selective etching can be rapidly identified with high resolution and low destruction.

TL;DR: In this paper, the physical principles of blazed gratings, specific approaches and the achievements of typical processing methods, including mechanical ruling, holographic ion beam etching, electron beam lithography, wet etching etc.

TL;DR: In this article, the atomic structures, chemical, and mechanical properties of as-received, hydrochloric acid-etched, and ultraviolet-irradiated GaAs surfaces were characterized, and their roles in atomic attrition dominated by mechanochemical reactions were revealed at atomic scale.

TL;DR: In this article, an atomic force microscope diamond tip was used for the preparation of friction-induced hillocks, mainly consisting of amorphous Si, through reciprocating sliding of Si surfaces below critical contact pressure.

TL;DR: In this paper, the effects of Si crystal planes on surface topography evolution during nanoscratch-induced selective etching in the commonly used etchants, i.e., KOH, tetra-methyl-ammonium hydroxide (TMAH), and a mixture of hydrofluoric acid (HF) and nitric acid (HNO3), were investigated using a single-asperity diamond tip.