scispace - formally typeset
L

Lionel Santinacci

Researcher at Aix-Marseille University

Publications -  73
Citations -  1167

Lionel Santinacci is an academic researcher from Aix-Marseille University. The author has contributed to research in topics: Atomic layer deposition & Layer (electronics). The author has an hindex of 21, co-authored 64 publications receiving 1034 citations. Previous affiliations of Lionel Santinacci include École Polytechnique Fédérale de Lausanne & Centre national de la recherche scientifique.

Papers
More filters
Journal ArticleDOI

Atomic Layer Deposition of Pd Nanoparticles on TiO2 Nanotubes for Ethanol Electrooxidation: Synthesis and Electrochemical Properties

Loïc Assaud, +6 more
- 27 Oct 2015 - 
TL;DR: The electrooxidation of ethanol on Pd clusters deposited on TiO2 nanotubes shows not only a direct correlation between the catalytic activity and the particle size but also a steep increase of the response due to the enhancement of the metal-support interaction when the crystal structure of the TiO 2 nanot tubes is modified by annealing at 450 °C in air.
Journal ArticleDOI

Electron beam-induced carbon masking for electrodeposition on semiconductor surfaces

Thierry Djenizian, +2 more
- 02 May 2001 - 
TL;DR: In this article, the authors demonstrate that under optimized electrochemical conditions electrodeposition of Au can be blocked selectively by single line carbon deposits in the order of only 1 nm thickness, and the lateral resolution of this negative patterning process is in the sub 100 nm range.
Journal ArticleDOI

Selective palladium electrochemical deposition onto AFM-scratched silicon surfaces

Lionel Santinacci, +6 more
- 30 Sep 2003 - 
TL;DR: In this article, the selective electrochemical deposition of palladium nano-structures into scratches produced through thin oxide layers covering p -Si (1 0 0) surfaces was investigated using an atomic force microscope equipped with a single-crystalline diamond tip.
Journal ArticleDOI

Atomic Layer Deposition from Dissolved Precursors

Yanlin Wu, +7 more
- 29 Sep 2015 - 
TL;DR: A novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursor toward precursors dissolved in a liquid, based on the hydrolysis of a Grignard reagent is established.
Journal ArticleDOI

3D-nanoarchitectured Pd/Ni catalysts prepared by atomic layer deposition for the electrooxidation of formic acid.

Loïc Assaud, +7 more
- 12 Feb 2014 - 
TL;DR: Three-dimensionally (3D) nanoarchitectured palladium/nickel (Pd/Ni) catalysts, which were prepared by atomic layer deposition (ALD) on high-aspect-ratio nanoporous alumina templates are investigated with regard to the electrooxidation of formic acid in an acidic medium.