M
M. Tokairin
Researcher at Tohoku University
Publications - 8
Citations - 328
M. Tokairin is an academic researcher from Tohoku University. The author has contributed to research in topics: Solar cell & Casting. The author has an hindex of 5, co-authored 8 publications receiving 303 citations.
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Journal ArticleDOI
Growth of structure-controlled polycrystalline silicon ingots for solar cells by casting
Kozo Fujiwara,Wugen Pan,Noritaka Usami,Kohei Sawada,M. Tokairin,Yoshitaro Nose,Akiko Nomura,Toetsu Shishido,Kazuo Nakajima +8 more
TL;DR: In this paper, a new concept of growing a polycrystalline Si ingot suitable for solar cells by casting based on the directional growth behavior of polycrystaline Si investigated using an in situ observation system.
Journal ArticleDOI
Directional growth method to obtain high quality polycrystalline silicon from its melt
Kozo Fujiwara,Wugen Pan,Kohei Sawada,M. Tokairin,Noritaka Usami,Yoshitaro Nose,Akiko Nomura,Toetsu Shishido,Kazuo Nakajima +8 more
TL;DR: In this article, a new concept for growing a polycrystalline silicon ingot suitable for solar cells by the casting method was proposed, which induced dendrite growth along the crucible wall in the initial stage of growth.
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Formation mechanism of a faceted interface: In situ observation of the Si(100) crystal-melt interface during crystal growth
TL;DR: In this article, the formation mechanism of a faceted crystal-melt interface was investigated by in situ observation and it was directly proved that a wavy perturbation is introduced into a planar crystal melt interface and the perturbations results in zigzag facets.
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Pattern formation mechanism of a periodically faceted interface during crystallization ofSi
TL;DR: In this paper, the pattern formation mechanism of a periodically faceted crystal-melt interface during the crystallization of Si was investigated by in situ observation, and it was directly proved that spacing between the reentrants of adjacent zigzag facets increases with the unification of adjacent facets when a facet with a higher growth velocity catches up with the one with a lower growth velocity.
Journal ArticleDOI
Growth behavior of faceted Si crystals at grain boundary formation
Kozo Fujiwara,S. Tsumura,M. Tokairin,Kentaro Kutsukake,Noritaka Usami,Satoshi Uda,Kazuo Nakajima +6 more
TL;DR: In this article, the growth behavior of faceted Si crystals in grain boundary formation during crystallization was studied by the in situ observation technique, and the transition of the shape of the growing interface just before the impingement of two crystals was directly observed.