M
Margit Ferstl
Researcher at Fraunhofer Society
Publications - 5
Citations - 108
Margit Ferstl is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Diffraction efficiency & Fresnel zone. The author has an hindex of 3, co-authored 5 publications receiving 105 citations.
Papers
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Journal ArticleDOI
Static and dynamic Fresnel zone lenses for optical interconnections
Margit Ferstl,A. M. Frisch +1 more
TL;DR: In this paper, the design and fabrication of the static and dynamic, on-and off-axis Fresnel zone lenses as well as their optical and switching properties are presented, and the switching behavior of the dynamic lenses is studied.
Journal ArticleDOI
Diffraction-based solid immersion lens
Robert Brunner,Matthias Burkhardt,Alexander Pesch,Oliver Sandfuchs,Margit Ferstl,Sungchul Hohng,Jeffrey O. White +6 more
TL;DR: A solid immersion lens based on diffraction (dSIL) is proposed as an alternative to the conventional design based on refraction and results are in accord with the expected resolution enhancement of a factor n with respect to the diffraction limit.
Proceedings ArticleDOI
Diffractive solid immersion lenses: characterization and manufacturing
TL;DR: In this paper, a diffractive solid immersion lens (dSIL) was realized, which is the diffractive analog of the refractive hemispherical SIL, where inside the medium the propagation angles of the first order diffracted waves point in the same direction as the incident angles from outside the SIL.
Journal ArticleDOI
Theoretical and experimental properties of a binary linear beam-splitting element with a large fan angle
TL;DR: In this article, two different gratings have been designed using scalar unidirectional iterative methods, based on the iterative discrete on-axis and on the direct binary search algorithms.
Proceedings ArticleDOI
Lithographically fabricated micro-optical array beam shapers for ultra-short pulse lasers
TL;DR: In this article, reflective micro-optical components for shaping non-diffracting beam arrays were fabricated by proportional transfer of continuous resist profiles into silica and silicon via e-beam writing and gray-tone lithography.