M
Masayoshi Umeno
Researcher at Chubu University
Publications - 302
Citations - 4521
Masayoshi Umeno is an academic researcher from Chubu University. The author has contributed to research in topics: Chemical vapor deposition & Thin film. The author has an hindex of 35, co-authored 302 publications receiving 4190 citations. Previous affiliations of Masayoshi Umeno include Nagoya Institute of Technology.
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Planer nano-graphenes from camphor by CVD
TL;DR: In this paper, planer graphene and planer few layer graphenes (PFLG) were synthesized from camphor pyrolysis on nickel substrates by simple, cost effective thermal CVD method and studied using HR-TEM, visible Raman spectroscopy, XRD and FE-SEM.
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Iodine doping in solid precursor-based CVD growth graphene film
TL;DR: In this article, a simple and controllable synthesis process of iodine-doped graphene film using camphor (C10H16O), a solid botanical derivative, was demonstrated.
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Low temperature growth of graphene film by microwave assisted surface wave plasma CVD for transparent electrode application
TL;DR: In this paper, the authors reported the synthesis of a graphene film on Cu foil by microwave assisted surface wave plasma chemical vapor deposition (MW-SWP-CVD) at a low pressure and temperature using a hydrocarbon gas.
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Carbon nanotubes by spray pyrolysis of turpentine oil at different temperatures and their studies
Rakesh A. Afre,Tetsuo Soga,Takashi Jimbo,Mukul Kumar,Yoshinori Ando,Madhuri Sharon,Prakash R. Somani,Masayoshi Umeno +7 more
TL;DR: In this paper, the carbon nanotubes (CNTs) synthesized by simple method of spray pyrolysis and their characteristics were investigated and confirmed by SEM, TEM, HRTEM and Raman spectroscopy studies.
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Room-temperature laser operation of AlGaAs/GaAs double heterostructures fabricated on Si substrates by metalorganic chemical vapor deposition
TL;DR: AlGaAs/GaAs double heterostructure laser diodes have been fabricated on Si substrates using GaP/(GaP/GAsP) superlattice/(GaAsP/GAAs) intermediate layers grown by metalorganic chemical vapor deposition as discussed by the authors.