T
Takashi Jimbo
Researcher at Nagoya Institute of Technology
Publications - 371
Citations - 6576
Takashi Jimbo is an academic researcher from Nagoya Institute of Technology. The author has contributed to research in topics: Thin film & Amorphous carbon. The author has an hindex of 41, co-authored 371 publications receiving 6246 citations.
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Surface passivation effects on AlGaN/GaN high-electron-mobility transistors with SiO2, Si3N4, and silicon oxynitride
TL;DR: In this paper, surface passivation effects were studied on AlGaN/GaN high-electron-mobility transistors (HEMTs) using SiO2, Si3N4, and silicon oxynitride (SiON) formed by plasma enhanced chemical vapor deposition.
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Optical properties and X-ray photoelectron spectroscopic study of pure and Pb-doped TiO2 thin films
TL;DR: In this paper, pure and Pb-doped (5 and 10mol %) titanium dioxide (TiO2) thin films have been deposited on single-crystal Si (100) and vitreous silica substrates by the sol-gel dip-coating method.
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Thermal annealing effects on Ni/Au based Schottky contacts on n-GaN and AlGaN/GaN with insertion of high work function metal
Narihisa Miura,Takuma Nanjo,Muneyoshi Suita,Toshiyuki Oishi,Yuji Abe,Tatsuo Ozeki,Hiroyasu Ishikawa,T. Egawa,Takashi Jimbo +8 more
TL;DR: In this paper, a high work function metal such as Pt, Ir, Pd or Mo was inserted to the conventional Ni/Au Schottky contact to n-GaN and AlGaN/GaN epilayers.
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Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition
Yasuhiko Hayashi,G. Yu,Md. Mosaddeq ur Rahman,K. M. Krishna,Tetsuo Soga,Takashi Jimbo,Masayoshi Umeno +6 more
TL;DR: In this paper, the dependence of the optical and structural properties on nitrogen incorporation were investigated using different spectroscopic techniques, such as, Raman spectroscopy, Fourier transform infrared (FTI), x-ray photo-electron spectrography, ultraviolet-visible (UV-VIS) and electron spin resonance (ESR), photoluminescence (PL) and Spectroscopic ellipsometry (SE).
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Characterization of transparent conducting CuI thin films prepared by pulse laser deposition technique
TL;DR: In this paper, thin films of CuI were prepared by pulse laser deposition technique and their characteristics were studied, and they exhibited optical transmittance over 80% in the wavelength range 400-900 nm and minimum resistivity of about 2 K Ω cm.