Optical tweezers use the forces exerted by a strongly focused beam of light to trap and move objects ranging in size from tens of nanometres to tens of micrometres. Since their introduction in 1986, the optical tweezer has become an important tool for research in the fields of biology, physical chemistry and soft condensed matter physics. Recent advances promise to take optical tweezers out of the laboratory and into the mainstream of manufacturing and diagnostics; they may even become consumer products. The next generation of single-beam optical traps offers revolutionary new opportunities for fundamental and applied research.

http://physics.nyu.edu/grierlab/nreview2c/nreview2c.pdf

A revolution in optical manipulation

Microfluidic devices are finding increasing application as analytical systems, biomedical devices, tools for chemistry and biochemistry, and systems for fundamental research. Conventional methods of fabricating microfluidic devices have centered on etching in glass and silicon. Fabrication of microfluidic devices in poly(dimethylsiloxane) (PDMS) by soft lithography provides faster, less expensive routes than these conventional methods to devices that handle aqueous solutions. These soft-lithographic methods are based on rapid prototyping and replica molding and are more accessible to chemists and biologists working under benchtop conditions than are the microelectronics-derived methods because, in soft lithography, devices do not need to be fabricated in a cleanroom. This paper describes devices fabricated in PDMS for separations, patterning of biological and nonbiological material, and components for integrated systems.

Fabrication of microfluidic systems in poly(dimethylsiloxane)

Laser ablation of solid targets by 0.2–5000 ps Ti: Sapphire laser pulses is studied. Theoretical models and qualitative explanations of experimental results are presented. Advantages of femtosecond lasers for precise material processing are discussed and demonstrated.

Femtosecond, picosecond and nanosecond laser ablation of solids

Nanosphere lithography (NSL) is an inexpensive, simple to implement, inherently parallel, high throughput, materials general nanofabrication technique capable of producing an unexpectedly large variety of nanoparticle structures and well-ordered 2D nanoparticle arrays. This article describes our recent efforts to broaden the scope of NSL to include strategies for the fabrication of several new nanoparticle structural motifs and their characterization by atomic force microscopy. NSL has also been demonstrated to be well-suited to the synthesis of size-tunable noble metal nanoparticles in the 20−1000 nm range. This characteristic of NSL has been especially valuable for investigating the fascinating richness of behavior manifested in size-dependent nanoparticle optics. The use of localized surface plasmon resonance (LSPR) spectroscopy to probe the size-tunable optical properties of Ag nanoparticles and their sensitivity to the local, external dielectric environment (viz., the nanoenvironment) is discussed in...

Nanosphere Lithography: A Versatile Nanofabrication Tool for Studies of Size-Dependent Nanoparticle Optics

http://www.df.uba.ar/users/bragas/Optica%20en%20la%20nanoescala/Papers/1998_Oldenburg_ChemPhysLett_NanoengineeringOpticalResonances.pdf

Nanoengineering of optical resonances

Laser ablation of Nickel, Copper, Molybdenum, Indium, Tungsten and Gold by short ultraviolet laser pulses (0.5 ps, 248 nm) in vacuum is reported for the first time. For Nickel and Indium, ablation is also studied in air to demonstrate the influence of the ambient atmosphere. Metal ablation in air is significantly less efficient than in vacuum due to redeposition of ablated material. The ablation rates in vacuum are discussed using a thermal model, which also allows to estimate ablation rates for other metals from basic optical and thermal properties. A comparison of the morphology of ablation sites after nanosecond and sub-picosecond ablation shows unequivocally the advantages of short-pulse laser ablation for high-precision patterning of thermally good conducting materials in micron-scale dimensions.

/pdf/sub-picosecond-uv-laser-ablation-of-metals-3in25mxg4z.pdf

Sub-picosecond UV laser ablation of metals

Experiments on the ablation of polymethylmethacrylate (PMMA) with 300 fs uv excimer laser pulses at 248 nm are reported for the first time. With these ultrashort pulses, ablation can be done at fluences up to five times lower than the threshold fluence for 16 ns ablation of PMMA, and the surface morphology is improved, also for several other materials. A model for ablation is proposed, assuming a non-constant absorption coefficient αeff depending on the degree of incubation of the irradiated material and the intensity of the incoming excimer laser pulse. The agreement between our model and our experimental observations is excellent for 16 ns excimer laser pulses, also predicting perfectly the shape of a pulse transmitted through a thin PMMA sample under high fluence irradiation. Qualitative agreement for 300 fs excimer laser pulses is obtained so far.

Femtosecond UV excimer laser ablation

Three-dimensional periodic microstructures of aluminum oxide, which are important for creating photonic band-gap structures (PBGs), were fabricated by laser rapid prototyping by means of laser-induced direct-write deposition from the gas phase. The structures consisted of layers of parallel rods forming a face-centered tetragonal lattice with lattice constants of 66 and 133 micrometers. These structures showed transmission minima centered around 4 terahertz (75 micrometers) and 2 terahertz (150 micrometers), respectively. PBGs will allow precise control of the optical properties of materials, including lasers without threshold.

https://science.sciencemag.org/content/sci/275/5304/1284.full.pdf

Laser Rapid Prototyping of Photonic Band-Gap Microstructures

Experiments on the ablation of undoped polytetrafluoroethylene (Teflon) with 300 fs UV excimer laser pulses at 248 nm are reported for the first time. In contrast to standard excimer laser pulses, these ultrashort pulses ablate Teflon with good edge quality and no signs of thermal damage for fluences down to 0.5 J/cm2 with removal rates on the order of 1 μm per pulse.

/pdf/ablation-of-polytetrafluoroethylene-teflon-with-femtosecond-2jiiy2tey7.pdf

Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses

Ultraviolet and Fourier transform infrared (FTIR) spectroscopic experiments with thin films of polymethylmethacrylate (PMMA) are reported. During the incubation with 248 nm excimer laser light or continuous (cw) UV light sources PMMA exhibits a rapidly increasing, broad UV absorption. This is caused by the production of unsaturated species, which are detected in the infrared spectrum of irradiated PMMA films. The spectral data explain the incubation process preceding the ablation of PMMA at 248 nm. Taking advantage of the increased UV absorption, cw light incubated PMMA films can be selectively ablated by standard 308 nm excimer laser pulses.

/pdf/uv-excimer-laser-ablation-of-polymethylmethacrylate-at-248-4gg33in2ob.pdf

Michael Stuke

Papers

Sub-picosecond UV laser ablation of metals

Femtosecond UV excimer laser ablation

Laser Rapid Prototyping of Photonic Band-Gap Microstructures

Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses

UV-excimer-laser ablation of polymethylmethacrylate at 248 nm: Characterization of incubation sites with Fourier transform IR- and UV-Spectroscopy