Singular optics is a branch of modern physical optics that involves a wide class of effects associated with the phase singularities in wave fields and with the topology of wave fronts. Optical singularities (optical vortices) exhibit some fundamental features absent in the "usual" fields with smooth wave fronts. Namely, optical vortices possess orbital angular momentum, topological charge for helical wave front of beams with well-defined direction of propagation. As a result, an interesting spatial evolution can be generated such as optical vortices "nucleation" and "annihilation" by pairs with participation of phase saddles, often called "optical chemistry." To study the structure of the circular edge dislocation, an isolated dark (zero-amplitude) ring is created within a light beam, with an analytical description of the field. A screw wave-front dislocation has a feature that the spatial structure of the wave front has the form of a helicoid around the dislocation axis. The chapter also describes reflection, refraction, interference and diffraction of OVs. Both frequency up- and down-conversion processes possess essential peculiarities for light beams with OVs. The chapter discusses the topology of wave fronts and vortex trajectories. Gouy phase shift in singular optics is also described in the chapter.

Chapter 4 - Singular optics

The theory of image formation is formulated in terms of the coherence function in the object plane, the diffraction distribution function of the image-forming system and a function describing the structure of the object. There results a four-fold integral involving these functions, and the complex conjugate functions of the latter two. This integral is evaluated in terms of the Fourier transforms of the coherence function, the diffraction distribution function and its complex conjugate. In fact, these transforms are respectively the distribution of intensity in an 'effective source', and the complex transmission of the optical system-they are the data initially known and are generally of simple form. A generalized 'transmission factor' is found which reduces to the known results in the simple cases of perfect coherence and complete incoherence. The procedure may be varied in a manner more suited to non-periodic objects. The theory is applied to study inter alia the influence of the method of illumination on the images of simple periodic structures and of an isolated line.

On the diffraction theory of optical images

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

Projection optical system and method for photolithography and exposure apparatus and method using same

Computer-generated holograms written on a liquid-crystal display can be used to generate dynamic light fields of arbitrary shape. This method was used to simultaneously trap polystyrene particles laterally and to displace them independently of one another.

Optical particle trapping with computer-generated holograms written on a liquid-crystal display.

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.

Microlithographic projection exposure apparatus

Like conventional antennas, optical nanoantennas can transmit and receive signals but on much smaller length scales. Dregely et al. measure the optical power transmitted and received in the far-field by plasmonic nanoantennas and show that they can control the direction of transmission over a broad range.

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Imaging and steering an optical wireless nanoantenna link

Photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses can now produce microelectronics containing features with a half-pitch as small as 40 nm. The big question is how much further can the technology be pushed?

Semiconductor fabrication: Pushing deep ultraviolet lithography to its limits

Handbook of Optical Systems: Physical Image Formation

In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.

Michael Totzeck

Papers

Microlithographic projection exposure apparatus

Imaging and steering an optical wireless nanoantenna link

Semiconductor fabrication: Pushing deep ultraviolet lithography to its limits

Handbook of Optical Systems: Physical Image Formation

Projection system with compensation of intensity variations and compensation element therefor