M
Micheal Leach
Researcher at IBM
Publications - 1
Citations - 100
Micheal Leach is an academic researcher from IBM. The author has contributed to research in topics: Chemical-mechanical planarization & Semiconductor device fabrication. The author has an hindex of 1, co-authored 1 publications receiving 99 citations.
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Integration of chemical-mechanical polishing into CMOS integrated circuit manufacturing
Howard S. Landis,Peter J Burke,William J. Cote,William R. Hill,Cheryl A. Hoffman,Carter Welling Kaanta,Charles W. Koburger,Walter Frederick Lange,Micheal Leach,Stephen E. Luce +9 more
TL;DR: The use of chemical-mechanical polishing (CMP) has been exploited by IBM in the development and manufacture of CMOS products since 1985 as mentioned in this paper and has been used in the planarization of oxide shallow isolation trenches, as in the 16-Mbit DRAM.