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Nathaniel E. Richey

Researcher at Stanford University

Publications -  19
Citations -  430

Nathaniel E. Richey is an academic researcher from Stanford University. The author has contributed to research in topics: Atomic layer deposition & Thin film. The author has an hindex of 8, co-authored 14 publications receiving 265 citations. Previous affiliations of Nathaniel E. Richey include University of Florida & University of Arizona.

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Understanding chemical and physical mechanisms in atomic layer deposition.

TL;DR: Together, these two fundamental processes of chemisorption and diffusion underlie the majority of mechanisms which contribute to material growth during a given ALD process, and the recognition of their role allows for more rational design of ALD parameters.
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Universal Length Dependence of Rod-to-Seed Exciton Localization Efficiency in Type I and Quasi-Type II CdSe@CdS Nanorods

TL;DR: It is reported that the rod-to-seed exciton localization efficiency decreases with the rod length but is independent of band alignment between the CdSe seed and CdS rod.
Journal ArticleDOI

Mechanistic Study of Nucleation Enhancement in Atomic Layer Deposition by Pretreatment with Small Organometallic Molecules

TL;DR: In this paper, the authors show that the poor nucleation may be caused by a lack of sufficiency of the materials used for thermal atomic layer deposition (ALD) on metal oxide surfaces.