P
P. K. Giri
Researcher at Indian Institute of Technology Guwahati
Publications - 179
Citations - 5781
P. K. Giri is an academic researcher from Indian Institute of Technology Guwahati. The author has contributed to research in topics: Photoluminescence & Raman spectroscopy. The author has an hindex of 38, co-authored 158 publications receiving 4528 citations. Previous affiliations of P. K. Giri include Shiv Nadar University & Kobe University.
Papers
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Self-catalytic growth of horizontal and straight Si nanowires on Si substrates using a sputter deposition technique
Soumen Dhara,P. K. Giri +1 more
TL;DR: In this article, the growth of horizontal and straight Si nanowires (NWs) on Si substrate using sputter deposition of the Si layer followed by thermal annealing at 1000°C and above was reported.
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Distinguishing defect induced intermediate frequency modes from combination modes in the Raman spectrum of single walled carbon nanotubes
TL;DR: In this paper, the authors investigated the origin of the intermediate frequency modes (IFMs) in the Raman spectrum of carbon nanotubes and found that the intensity of IFM at 929 cm−1 scale up with the increasing defect concentration.
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Nonexponentiality in photoinduced current transients in undoped semi‐insulating gallium arsenide
P. K. Giri,Y. N. Mohapatra +1 more
TL;DR: In this paper, an isothermal spectroscopic technique called time-analyzed transient spectroscopy (TATS) has been used to study photoinduced current transients in undoped semi-insulating GaAs.
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Studies on the surface swelling of ion-irradiated silicon: Role of defects
TL;DR: In this article, the authors measured the surface swelling on the amorphous Si layer using an atomic force microscope (AFM) and evaluated its thickness and microstructure by transmission electron microscopy (TEM) measurements.
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Growth kinetics of hybrid perovskite thin films on different substrates at elevated temperature and its direct correlation with the microstructure and optical properties
TL;DR: In this paper, the growth kinetics and scaling behavior of vacuum deposited CH3NH3PbBr3 thin film on various substrates were elucidated and correlated with its microstructural and optical properties.