R
Ramakrishnan Ayothi
Researcher at Cornell University
Publications - 31
Citations - 885
Ramakrishnan Ayothi is an academic researcher from Cornell University. The author has contributed to research in topics: Resist & Extreme ultraviolet lithography. The author has an hindex of 12, co-authored 31 publications receiving 835 citations. Previous affiliations of Ramakrishnan Ayothi include National Institute of Standards and Technology.
Papers
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Journal ArticleDOI
Anti-biofouling properties of comblike block copolymers with amphiphilic side chains.
Sitaraman Krishnan,Ramakrishnan Ayothi,Alexander Hexemer,John A. Finlay,Karen E. Sohn,Ruth Perry,Christopher K. Ober,Edward J. Kramer,Maureen E. Callow,James A. Callow,Daniel A. Fischer +10 more
TL;DR: Surfaces of novel block copolymers with amphiphilic side chains were studied for their ability to influence the adhesion of marine organisms and a mathematical model to extract depth-profile information from the normalized NEXAFS partial electron yield is developed.
Journal ArticleDOI
Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography
Seung Wook Chang,Ramakrishnan Ayothi,Daniel Bratton,Da Yang,Nelson Felix,Heidi B. Cao,Hai Deng,Christopher K. Ober +7 more
TL;DR: In this article, a series of tert-butyloxycarbonyl (t-Boc) protected C-4-hydroxyphenyl-calix[4]resorcinarenes derivatives were synthesized and evaluated as positive tone molecular glass resists for EUV lithography.
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Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
Nelson Felix,Lovejeet Singh,Indira Seshadri,Anuja De Silva,Luciana Meli,Charlie Liu,Cheng Chi,Jing Guo,Hoa Truang,Kristin Schmidt,John C. Arnold,Tsuyoshi Furukawa,Ramakrishnan Ayothi,Angelique Raley,Richard A. Farrell +14 more
TL;DR: In this paper, an ultrathin EUV patterning stack comprised of inorganic underlayer, polymer brush, and resist was demonstrated, with a good lithography process window and low defectivity on various inorganic substrates.
Patent
Photoacid generator compounds and compositions
TL;DR: In this paper, various ionic and non-ionic photoacid generator compounds and photoresist compositions are provided. And the methods of making and using these compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Journal ArticleDOI
Diazonaphthoquinone Molecular Glass Photoresists: Patterning without Chemical Amplification
TL;DR: In this paper, a p-tert-butyl calix[4]resorcinarene core functionalized with photoactive diazonapthoquinone groups (DNQ-CR) was synthesized using conventional wet chemistry techniques, such as NMR and powder X-ray diffraction.