scispace - formally typeset
R

Razvan A. Nistor

Researcher at IBM

Publications -  9
Citations -  212

Razvan A. Nistor is an academic researcher from IBM. The author has contributed to research in topics: Graphene & Layer (electronics). The author has an hindex of 6, co-authored 9 publications receiving 201 citations.

Papers
More filters
Journal ArticleDOI

The role of chemistry in graphene doping for carbon-based electronics.

TL;DR: Using large-scale ab initio simulations, it is shown the graphene surface acts as a catalytic reducing/oxidizing agent, driving the chemical disproportionation of adsorbed dopant layers into charge-transfer complexes which inject majority carriers into the 2D carbon lattice.
Journal ArticleDOI

Doping of adsorbed graphene from defects and impurities in SiO 2 substrates

TL;DR: In this paper, the authors use first-principles simulations to generate representative classes of experimentally known defect centers in passivated silicon dioxide substrates and study their charge transfer with adsorbed graphene.
Journal ArticleDOI

Crown Graphene Nanomeshes: Highly Stable Chelation-Doped Semiconducting Materials

TL;DR: In this paper, a chemically motivated approach to GNM doping based on selective pore-perimeter passivation and subsequent ion chelation is proposed, which leads to stable doping of the passivated GNMs-both n and p-doping are achieved within a rigid-band picture.
Journal ArticleDOI

Crown Graphene Nanomeshes: Highly Stable Chelation-Doped Semiconducting Materials

TL;DR: It is shown by first-principles calculations that ion chelation leads to stable doping of the passivated GNMs-both n- and p-doping are achieved within a rigid-band picture.
Journal ArticleDOI

High performance metal microstructure for carbon-based transparent conducting electrodes

TL;DR: In this article, a metal busbar microstructure is introduced to decrease the effective sheet resistance of both graphene and carbon nanotube films to a value suitable for use as transparent conducting electrodes (TCEs).