R
Rene A. Claus
Researcher at University of California, Berkeley
Publications - 13
Citations - 220
Rene A. Claus is an academic researcher from University of California, Berkeley. The author has contributed to research in topics: Extreme ultraviolet lithography & Phase retrieval. The author has an hindex of 5, co-authored 13 publications receiving 204 citations.
Papers
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Journal ArticleDOI
Transport of Intensity phase imaging by intensity spectrum fitting of exponentially spaced defocus planes
TL;DR: This work proposes an alternative method for solving the Transport of Intensity equation from a stack of through-focus intensity images taken by a microscope or lensless imager, which enables quantitative phase and amplitude imaging with improved accuracy and reduced data capture, while also being computationally efficient and robust to noise.
Journal ArticleDOI
Quantitative phase retrieval with arbitrary pupil and illumination
TL;DR: A general algorithm for combining measurements taken under various illumination and imaging conditions to quantitatively extract the amplitude and phase of an object wave is presented.
Proceedings ArticleDOI
Partially Coherent Phase Recovery by Kalman Filtering
TL;DR: In this paper, a Kalman filtering method is used to recover the phase of a thin object illuminated by partially coherent light, which is fast, efficient, robust to noise, and able to handle arbitrary source shapes when used in a microscope with Kohler illumination.
Proceedings ArticleDOI
Phase measurements of EUV mask defects
Rene A. Claus,Yow-Gwo Wang,Antoine Wojdyla,Markus P. Benk,Kenneth A. Goldberg,Andrew R. Neureuther,Patrick P. Naulleau,Laura Waller +7 more
TL;DR: In this paper, a weak object transfer function (WOTF) was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects of extreme ultraviolet (EUV) lithography mask defects.
Proceedings ArticleDOI
Extreme ultraviolet mask roughness: requirements, characterization, and modeling
Patrick P. Naulleau,Suchit Bhattaria,Rick Chao,Rene A. Claus,Ken Goldberg,Frank Goodwin,Eric M. Gullikson,Donggun Lee,Andrew R. Neureuther,Jongju Park +9 more
TL;DR: In this article, the authors evaluate mask roughness specifications explicitly from the actinic inspection perspective and demonstrate a significant discrepancy between atomic force microscopy (AFM) results and true EUV roughness as measured by actinic scattering.