P
Patrick P. Naulleau
Researcher at Lawrence Berkeley National Laboratory
Publications - 464
Citations - 5856
Patrick P. Naulleau is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Extreme ultraviolet. The author has an hindex of 34, co-authored 455 publications receiving 5542 citations. Previous affiliations of Patrick P. Naulleau include State University of New York System & University at Albany, SUNY.
Papers
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Journal ArticleDOI
Real space soft x-ray imaging at 10 nm spatial resolution.
Weilun Chao,Peter Fischer,Tolek Tyliszczak,Senajith Rekawa,Erik H. Anderson,Patrick P. Naulleau +5 more
TL;DR: Using Fresnel zone plates made with robust nanofabrication processes, the authors achieved 10 nm spatial resolution with soft x-ray microscopy using a conventional full-field and scanning soft X-ray microscope, marking a significant step forward in extending the microscopy to truly nanoscale studies.
Journal ArticleDOI
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy
TL;DR: The phase-shifting point-diffraction interferometer (PS/PDI) was recently developed and implemented at Lawrence Berkeley National Laboratory to characterize extreme-ultraviolet (EUV) projection optical systems for lithography is quantitatively characterized.
Journal ArticleDOI
Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy.
Pascal Mercère,Philippe Zeitoun,Mourad Idir,Sébastien Le Pape,Denis Douillet,Xavier Levecq,Guillaume Dovillaire,Samuel Bucourt,Kenneth A. Goldberg,Patrick P. Naulleau,Senajith Rekawa +10 more
TL;DR: This report reports, for the first time to the authors' knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range using a spatially unfiltered incident beam to characterize a sensor.
Proceedings ArticleDOI
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
Patrick P. Naulleau,Kenneth A. Goldberg,Erik H. Anderson,Kevin Bradley,Rene Delano,Paul Denham,Bob Gunion,Bruce Harteneck,Brian Hoef,Hanjing Huang,Keith Jackson,Gideon Jones,Drew Kemp,James Alexander Liddle,Ron Oort,Al Rawlins,Senajith Rekawa,Farhad Salmassi,Ron Tackaberry,C. Chung,Layton C. Hale,D. W. Phillion,Gary E. Sommargren,John S. Taylor +23 more
TL;DR: In this paper, the Sematech Set-2 Micro Exposure Tool (MET) has been used for developmental micro-field printing at the Advanced Light Source (ALS) at Lawrence Berkeley National Laboratory.
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Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
TL;DR: What is to the authors' knowledge a new imaging transfer function referred to as the LER transfer function (LTF), which fundamentally differs from both the conventional modulation transfer function and the optical transfer function is presented.