Deposits of clastic carbonate-dominated (calciclastic) sedimentary slope systems in the rock record have been identified mostly as linearly-consistent carbonate apron deposits, even though most ancient clastic carbonate slope deposits fit the submarine fan systems better. Calciclastic submarine fans are consequently rarely described and are poorly understood. Subsequently, very little is known especially in mud-dominated calciclastic submarine fan systems. Presented in this study are a sedimentological core and petrographic characterisation of samples from eleven boreholes from the Lower Carboniferous of Bowland Basin (Northwest England) that reveals a >250 m thick calciturbidite complex deposited in a calciclastic submarine fan setting. Seven facies are recognised from core and thin section characterisation and are grouped into three carbonate turbidite sequences. They include: 1) Calciturbidites, comprising mostly of highto low-density, wavy-laminated bioclast-rich facies; 2) low-density densite mudstones which are characterised by planar laminated and unlaminated muddominated facies; and 3) Calcidebrites which are muddy or hyper-concentrated debrisflow deposits occurring as poorly-sorted, chaotic, mud-supported floatstones. These

Phd by thesis

Non-volatile memories will play a decisive role in the next generation of digital technology. Flash memories are currently the key player in the field, yet they fail to meet the commercial demands of scalability and endurance. Resistive memory devices, and in particular memories based on low-cost, solution-processable and chemically tunable organic materials, are promising alternatives explored by the industry. However, to date, they have been lacking the performance and mechanistic understanding required for commercial translation. Here we report a resistive memory device based on a spin-coated active layer of a transition-metal complex, which shows high reproducibility (∼350 devices), fast switching (≤30 ns), excellent endurance (∼1012 cycles), stability (>106 s) and scalability (down to ∼60 nm2). In situ Raman and ultraviolet-visible spectroscopy alongside spectroelectrochemistry and quantum chemical calculations demonstrate that the redox state of the ligands determines the switching states of the device whereas the counterions control the hysteresis. This insight may accelerate the technological deployment of organic resistive memories.

Robust Resistive Memory Devices Using Solution-Processable Metal-Coordinated Azo-aromatics

The conductivity of an $n$-type semiconductor has been calculated in the region of low-temperature $T$ and low impurity concentration ${n}_{D}$. The model is that of phonon-induced electron hopping from donor site to donor site where a fraction $K$ of the sites is vacant due to compensation. To first order in the electric field, the solution to the steady-state and current equations is shown to be equivalent to the solution of a linear resistance network. The network resistance is evaluated and the result shows that the $T$ dependence of the resistivity is $\ensuremath{\rho}\ensuremath{\propto}\mathrm{exp}(\frac{{\ensuremath{\epsilon}}_{3}}{\mathrm{kT}})$. For small $K$, ${\ensuremath{\epsilon}}_{3}=(\frac{{e}^{2}}{{\ensuremath{\kappa}}_{0}}){(\frac{4\ensuremath{\pi}{n}_{D}}{3})}^{\frac{1}{3}}(1\ensuremath{-}1.35{K}^{\frac{1}{3}})$, where ${\ensuremath{\kappa}}_{0}$ is the dielectric constant. At higher $K$, ${\ensuremath{\epsilon}}_{3}$ and $\ensuremath{\rho}$ attain a minimum near $K=0.5$. The dependence on ${n}_{D}$ is extracted; the agreement of the latter and of ${\ensuremath{\epsilon}}_{3}$ with experiment is satisfactory. The magnitude of $\ensuremath{\rho}$ is in fair agreement with experiment. The influence of excited donor states on $\ensuremath{\rho}$ is discussed.

Impurity Conduction at Low Concentrations.

Gallium oxide is a wide bandgap n-type semiconductor highly interesting for optoelectronic applications (e.g., power electronics and solar blind UV photodetectors). Besides its most thermodynamically stable monoclinic β phase, Ga2O3 can crystallize in different polymorphs; among them the corundum α and the orthorhombic e phases are the most promising ones. In this review we focus on the main aspects that promote the nucleation and stable growth of these Ga2O3 polymorphs. Particular emphasis is given to the e phase since it is recently gaining increasing attention in the scientific community because of: (i) its higher lattice symmetry with respect to β-Ga2O3, which could favour the realization of heterostructures, (ii) the possibility to be grown on cheap sapphire substrates and (iii) its peculiar piezoelectric properties. While the growth of β-Ga2O3 is widely studied and understood, a thorough and comprehensive analysis of the chemical and physical aspects that allow for the stabilization of the metastable Ga2O3 phases with different synthesis methods is still missing. Therefore, the present review aims at filling this gap, by analysing the relevant growth parameters for several growth techniques (MOVPE, HVPE, mist-CVD, MBE, and PLD), highlighting similarities and differences, looking for a unified framework to understand the growth and nucleation of different Ga2O3 polymorphs. As a conclusion, we highlight practical guidelines for the deposition of the different Ga2O3 polymorphs with all the discussed thin film growth techniques.

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Ga2O3 polymorphs: tailoring the epitaxial growth conditions

This tutorial describes challenges and possible avenues for the implementation of the components of a solid-state system, which emulates a biological brain. The tutorial is devoted mostly to a charge-based (i.e. electric controlled) implementation using transition metal oxides materials, which exhibit unique properties that emulate key functionalities needed for this application. In the Introduction, we compare the main differences between a conventional computational machine, based on the Turing-von Neumann paradigm, to a Neuromorphic machine, which tries to emulate important functionalities of a biological brain. We also describe the main electrical properties of biological systems, which would be useful to implement in a charge-based system. In Chapter II, we describe the main components of a possible solid-state implementation. In Chapter III, we describe a variety of Resistive Switching phenomena, which may serve as the functional basis for the implementation of key devices for Neuromorphic computing. In Chapter IV we describe why transition metal oxides, are promising materials for future Neuromorphic machines. Theoretical models describing different resistive switching mechanisms are discussed in Chapter V while existing implementations are described in Chapter VI. Chapter VII presents applications to practical problems. We list in Chapter VIII important basic research challenges and open issues. We discuss issues related to specific implementations, novel materials, devices and phenomena. The development of reliable, fault tolerant, energy efficient devices, their scaling and integration into a Neuromorphic computer may bring us closer to the development of a machine that rivals the brain.

Challenges in materials and devices for Resistive-Switching-based Neuromorphic Computing

Low resistivity n-type e-Ga2O3 epilayers were obtained for the first time either by adding silane to the gas phase during the metal organic vapour phase epitaxy deposition or by diffusing Sn in nominally undoped layers after the growth. The highest doping concentrations were few 1018 cm−3 and about 1017 cm−3 for Si and Sn doping, with corresponding resistivity below 1 and 10 Ω cm, respectively. Temperature dependent transport investigation in the range of 10-600 K shows a resistivity behavior consistent with the Mott law, suggesting that conduction through localized states dominates the electrical properties of Si- and Sn-doped samples. For both types of dopants, two different mechanisms of conduction through impurity band states seem to be present, each of them determining the transport behavior at the lower and higher temperatures of the measurement range.

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Si and Sn doping of ε-Ga2O3 layers

In this work, the conduction mechanisms across novel contacts to epitaxial films of pure phase epsilon-Ga2O3 (e-Ga2O3) were investigated. Different structures made by sputtered metal and oxide thin films were tested as electrical contacts. I-V characteristics show heterogeneous behaviors, revealing different conduction mechanisms according to the applied bias. The results are interesting as they offer a viable method to obtain ohmic contacts on e-Ga2O3, which is less studied than other gallium oxide polymorphs but may find application in new electronic and optoelectronic devices. The newly developed ohmic contacts allow to fabricate simple test devices and assess the potential of this material.

A Metal-Oxide Contact to ε-Ga2O3 Epitaxial Films and Relevant Conduction Mechanism

n-Type doping of ε-Ga2O3 epilayers by high-temperature tin diffusion

Structures composed of a p++(Zn)GaAs layer deposited by MOVPE on a n(Te)-doped GaSb substrate were fabricated, with the purpose of obtaining GaSb p-n homo-junctions, through the diffusion of Zn into the substrate, for photovoltaic applications. Different Zn doping levels and post-growth annealing parameters were investigated. The junctions were characterized from the electrical point of view by I-V measurements, while Zn diffusion profiles were studied by SIMS analysis. The effective achievement of a GaSb buried junction, whose profile is characterized by a limited Zn diffusion into the substrate, was evidenced. Efficiency measurements by a solar simulator on 5x5 mm2 samples were also performed in order to investigate the photovoltaic properties of the structure. (© 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Salvatore Vantaggio

Papers

Si and Sn doping of ε-Ga2O3 layers

A Metal-Oxide Contact to ε-Ga2O3 Epitaxial Films and Relevant Conduction Mechanism

n-Type doping of ε-Ga2O3 epilayers by high-temperature tin diffusion

Growth and characterization of buried GaSb p‐n junctions for photovoltaic applications

Sol-gel growth and characterization of In 2 O 3 thin films