S
Seiichirou Shirai
Researcher at Hitachi
Publications - 5
Citations - 109
Seiichirou Shirai is an academic researcher from Hitachi. The author has contributed to research in topics: Etching (microfabrication) & Phase-shift mask. The author has an hindex of 4, co-authored 5 publications receiving 109 citations.
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Patent
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
Jun Sugiura,Osamu Tsuchiya,Makoto Ogasawara,Fumio Ootsuka,Kazuyoshi Torii,Isamu Asano,Nobuo Owada,Mitsuaki Horiuchi,Tsuyoshi Tamaru,Hideo Aoki,Nobuhiro Otsuka,Seiichirou Shirai,Masakazu Sagawa,Yoshihiro Ikeda,Masatoshi Tsuneoka,Toru Kaga,Tomotsugu Shimmyo,Hidetsugu Ogishi,Osamu Kasahara,Hiromichi Enami,Atsushi Wakahara,Hiroyuki Akimori,Sinichi Suzuki,Keisuke Funatsu,Yoshinao Kawasaki,Tunehiko Tubone,Takayoshi Kogano,Ken Tsugane +27 more
TL;DR: In this paper, a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, is described.
Patent
Method of manufacturing phase shift masks and a method of manufacturing semiconductor integrated circuit devices
TL;DR: In this paper, a technique to minimize an increase in the design and manufacture times required for making phase shift masks is provided. But this technique is limited to the first phase shift mask and cannot be applied to other phases of the semiconductor substrate.
Patent
Semiconductor integrated circuit device having a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole and an aluminum wiring strip thereover, and a transition-metal nitride film between the aluminum wiring strip and the transition-metal film
Jun Sugiura,Osamu Tsuchiya,Makoto Ogasawara,Fumio Ootsuka,Kazuyoshi Torii,Isamu Asano,Nobuo Owada,Mitsuaki Horiuchi,Tsuyoshi Tamaru,Hideo Aoki,Nobuhiro Otsuka,Seiichirou Shirai,Masakazu Sagawa,Yoshihiro Ikeda,Masatoshi Tsuneoka,Toru Kaga,Tomotsugu Shimmyo,Hidetsugu Ogishi,Osamu Kasahara,Hiromichi Enami,Atsushi Wakahara,Hiroyuki Akimori,Sinichi Suzuki,Keisuke Funatsu,Yoshinao Kawasaki,Tunehiko Tubone,Takayoshi Kogano,Ken Tsugane +27 more
TL;DR: In this paper, a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, is described.
Patent
Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring
Jun Sugiura,Osamu Tsuchiya,Makoto Ogasawara,Fumio Ootsuka,Kazuyoshi Torii,Isamu Asano,Nobuo Owada,Mitsuaki Horiuchi,Tsuyoshi Tamaru,Hideo Aoki,Nobuhiro Otsuka,Seiichirou Shirai,Masakazu Sagawa,Yoshihiro Ikeda,Masatoshi Tsuneoka,Toru Kaga,Tomotsugu Shimmyo,Hidetsugu Ogishi,Osamu Kasahara,Hiromichi Enami,Atsushi Wakahara,Hiroyuki Akimori,Sinichi Suzuki,Keisuke Funatsu,Yoshinao Kawasaki,Tunehiko Tubone,Takayoshi Kogano,Ken Tsugane +27 more
TL;DR: In this paper, a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, is described.
Patent
Resist and pattern formation using the same.
Shoichi Uchino,Sonoko Migitaka,Takumi Ueno,Toshihiko Onozuka,Seiichirou Shirai,Noboru Moriuchi,Sasaki Mamoru,Michiaki Hashimoto,Nobuaki Hayashi +8 more
TL;DR: In this paper, a resist which comprises a water repellent compound having a functional group of which water-repellent ability disappears through a nucleophilic substitution reaction with alkali or at least two functional groups, in one molecule, and a permeability-variable composition of which alkaline solution-permeability is changed by radiation exposure or radiation exposure and baking after radiation exposure.