Y
Yoshinao Kawasaki
Researcher at Hitachi
Publications - 44
Citations - 797
Yoshinao Kawasaki is an academic researcher from Hitachi. The author has contributed to research in topics: Microwave & Plasma. The author has an hindex of 12, co-authored 44 publications receiving 797 citations.
Papers
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Patent
Plasma treating method and apparatus therefor
TL;DR: In this article, the etching step and the film formation step can be carried out alternately and the plasma treating time can be shortened, and a plasma treating apparatus comprises means for rendering a gas having a critical potential plasmic under a reduced pressure and means for changing an acceleration voltage for accelerating ions in the plasma towards a sample interposing the critical potential.
Patent
Vacuum processing apparatus and semiconductor manufacturing line using the same
TL;DR: In this paper, a plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape, and plan views of the cassette block and the vacuum block are nearly rectangular.
Patent
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
Jun Sugiura,Osamu Tsuchiya,Makoto Ogasawara,Fumio Ootsuka,Kazuyoshi Torii,Isamu Asano,Nobuo Owada,Mitsuaki Horiuchi,Tsuyoshi Tamaru,Hideo Aoki,Nobuhiro Otsuka,Seiichirou Shirai,Masakazu Sagawa,Yoshihiro Ikeda,Masatoshi Tsuneoka,Toru Kaga,Tomotsugu Shimmyo,Hidetsugu Ogishi,Osamu Kasahara,Hiromichi Enami,Atsushi Wakahara,Hiroyuki Akimori,Sinichi Suzuki,Keisuke Funatsu,Yoshinao Kawasaki,Tunehiko Tubone,Takayoshi Kogano,Ken Tsugane +27 more
TL;DR: In this paper, a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, is described.
Patent
Method and apparatus for processing samples
Masayuki Kojima,Yoshimi Torii,Michimasa Hunabashi,Kazuyuki Suko,Takashi Yamada,Keizo Kuroiwa,Kazuo Nojiri,Yoshinao Kawasaki,Yoshiaki Sato,Ryooji Fukuyama,Hironobu Kawahara +10 more
TL;DR: In this article, a plurality of wet-processing treatments of a sample can be performed, and the samples can either be passed in series through the plurality of dry-processing stations, or can be processed in parallel through the wetprocessing stations.
Patent
Microwave plasma processing method and apparatus
TL;DR: In this article, a microwave plasma processing method and apparatus of the type wherein a waveguide section includes electric discharge means isolated from the waveguide for the propagation of microwaves and having a plasma generation region therein, which is well suited for subjecting samples, such as semiconductor device substrates, to an etching process, a film forming process, etc.