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Seung Min Han

Researcher at KAIST

Publications -  98
Citations -  5436

Seung Min Han is an academic researcher from KAIST. The author has contributed to research in topics: Deformation (engineering) & Nanopillar. The author has an hindex of 30, co-authored 90 publications receiving 4461 citations. Previous affiliations of Seung Min Han include Korea University of Science and Technology & Brown University.

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A Personalized Electronic Tattoo for Healthcare Realized by On‐the‐Spot Assembly of an Intrinsically Conductive and Durable Liquid‐Metal Composite

TL;DR: In this article , a new class of e-tattoos is introduced that can be directly implemented on the skin by facile one-step coating with various designs at multi-scale depending on the purpose of the user without a substrate.
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Multiwavelength Raman characterization of silicon stress near through-silicon vias and its inline monitoring applications

TL;DR: In this paper, a polychromator-based, multi-wavelength micro-Raman spectroscopy system, including the importance of the high-spectral resolution and multiwavelength excitation capability in three-dimensional (3D) Si stress characterization, was described.
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A biopolymer-based functional separator for stable Li metal batteries with an additive-free commercial electrolyte

TL;DR: In this article, a polymer film composed of sodium alginate (Na-Alg), which is a natural biopolymer obtained from brown algae, and poly(ethylene oxide) (PEO) was used as a separator.
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Freestanding silicon microparticle and self-healing polymer composite design for effective lithiation stress relaxation

TL;DR: In this article, a freestanding silicon microparticle and self-healing polymer composite electrode was proposed to overcome the short cycle-life caused by electrical contact loss and active material pulverization.
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Sub-5 μm-thick spalled single crystal Si foils by decoupling crack initiation and propagation

TL;DR: In this paper, a spalling process to fabricate single crystal Si foils with controlled thicknesses ranging from sub-5 to 38μm is demonstrated using electroplated Ni stressor layers on Si substrates.