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T. D. Haeffner

Researcher at Vanderbilt University

Publications -  25
Citations -  400

T. D. Haeffner is an academic researcher from Vanderbilt University. The author has contributed to research in topics: Logic gate & MOSFET. The author has an hindex of 10, co-authored 22 publications receiving 290 citations.

Papers
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Journal ArticleDOI

Analysis of TID Process, Geometry, and Bias Condition Dependence in 14-nm FinFETs and Implications for RF and SRAM Performance

TL;DR: In a 14-nm FinFET technology, the modeling indicates devices with high channel stop doping show the most robust response to TID allowing stable operation of ring oscillators and the SRAM bit-cell with minimal shift in critical operating characteristics.
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On-Chip Measurement of Single-Event Transients in a 45 nm Silicon-on-Insulator Technology

TL;DR: In this paper, a built-in self-test circuit for the measurement of single event transients (SET) has been implemented in a 45 nm partially depleted silicon-on-insulator technology that allows for the extraction of measurement-induced uncertainty.
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Analysis of Bulk FinFET Structural Effects on Single-Event Cross Sections

TL;DR: In this paper, a set of upset criteria based on circuit characteristic switching time frame is developed and used to bridge transistor-level TCAD simulations to circuit-level single-event (SE) upset cross sections for advanced (fast and small) digital circuits.
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Circuit-Level Layout-Aware Single-Event Sensitive-Area Analysis of 40-nm Bulk CMOS Flip-Flops Using Compact Modeling

TL;DR: A circuit-level layout-aware single-event simulation capability that can be performed over the entire flip-flop layout and show excellent agreement with broadbeam heavy-ion test data is presented.
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The Application of RHBD to n-MOSFETs Intended for Use in Cryogenic-Temperature Radiation Environments

TL;DR: In this paper, the authors investigate the effect of proton and X-ray irradiation on conventional, annular, and ringed-source radiation-hardening-by-design (RHBD) CMOS devices.