Tangyou Sun

TL;DR: It is experimentally demonstrated that not only more accurate quantification of line width, line height, sidewall angle, and residual layer thickness of nanoimprinted resist patterns can be achieved, but also the residual layer Thickness variation over the illumination spot can be directly determined when performing MME measurements in the optimal configuration and meanwhile incorporating depolarization effects into the optical model.

TL;DR: In this paper, a photochemically activated solution-processed metal-oxide thin films at room temperature for fabrication of flexible memristor active resistive layers was used for resistive random access memory.

TL;DR: In this paper, transparent resistive switching cells using Al/SnO 2 :Mn/F:snO 2 capacitor were fabricated, which exhibited an optical transmittance of approximately 75% in the visible region (550nm).

TL;DR: A facile and efficient way to fabricate a highly flexible, transparent and efficient surface-enhanced Raman scattering (SERS) substrate, in which Au nanoparticles (NPs) were embedded into the polymeric nanopillars via a nanoimprint lithography (NIL) method and using an anodic aluminum oxide (AAO) template, was reported in this paper.

TL;DR: In this paper, a two-inch similar porous alumina silicon (Si) template with nanopore size of 50-100nm is fabricated. And the results reveal a significant incompatibility between these two candidates.