T
Toshinobu Ishihara
Researcher at Shin-Etsu Chemical
Publications - 59
Citations - 1133
Toshinobu Ishihara is an academic researcher from Shin-Etsu Chemical. The author has contributed to research in topics: Alkyl & Resist. The author has an hindex of 16, co-authored 59 publications receiving 1133 citations.
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Patent
Chemically amplified positive resist composition
TL;DR: In this article, a chemically amplified positive resist (CRS) was proposed, in which acid labile groups are incorporated into at least some of the hydrogen atoms on the carboxyl or phenolic hydroxyl groups so that the resin becomes insoluble or substantially insoluble in alkali.
Patent
Double patterning process
TL;DR: In this paper, double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile groupbearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form the first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant.
Patent
Resist material and patterning process
Toshinobu Ishihara,Takeshi Kanou,Tomohiro Kobayashi,Shigehiro Nagura,Tsunehiro Nishi,Satoshi Watanabe,茂広 名倉,知洋 小林,聡 渡邉,俊信 石原,恒寛 西,剛 金生 +11 more
TL;DR: In this article, a resist material that exhibits a high resolution and is effective in minimizing defects in photolithography using a high-energy line such as ArF excimer laser light as a light source, and a patterning process using the resist material.
Patent
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
Satoshi Watanabe,Osamu Watanabe,Tomoyoshi Furihata,Yoshihumi Takeda,Shigehiro Nagura,Toshinobu Ishihara,Tsuguo Yamaoka +6 more
TL;DR: In this article, a chemically amplified positive resist (C-O-COOH) composition was proposed, which contains an organic solvent, a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage.
Patent
High molecular weight silicone compounds resist compositions, and patterning method
Mutsuo Nakashima,Kaneko Ichiro,Toshinobu Ishihara,Junji Tsuchiya,Jun Hatakeyama,Shigehiro Nagura +5 more
TL;DR: In this paper, a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000 was provided, which is suitable for microfabrication with electron beams or deep UV.