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Tsutomu Kaneko

Researcher at University of Tokyo

Publications -  37
Citations -  577

Tsutomu Kaneko is an academic researcher from University of Tokyo. The author has contributed to research in topics: Whisker & Silicon carbide. The author has an hindex of 13, co-authored 35 publications receiving 556 citations. Previous affiliations of Tsutomu Kaneko include Tokyo University of Science.

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FTIR analysis of a-SiC:H films grown by plasma enhanced CVD

TL;DR: In this article, a-SiC:H grown on Si single crystal (1.0.0) by plasma-enhanced chemical vapor deposition (PECVD) is analyzed by Fourier transform infrared (FTIR) spectroscopy.
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In situ measurements and growth kinetics of silicon carbide chemical vapor deposition from methyltrichlorosilane

TL;DR: In this paper, the growth kinetics of silicon carbide (SiC) by chemical vapor deposition (CVD) from methyltrichlorosilane (MTS): CH 3 SiCl 3 ) was investigated by in situ measurements of growth rates, which were converted from the deposited weight by thermogravimetry, as a function of temperature and partial pressure of MTS (P MTS ).
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Growth mechanism of vapor liquid solid (VLS) grown indium tin oxide (ITO) whiskers along the substrate

TL;DR: In this paper, two types of ITO whiskers having an In-Sn-O droplet on the tip were grown by VLS mechanism: lateral and normal whiskers, and the growth rates of normal and lateral whiskers were 10 and, 0.6nm/s, respectively.
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Dielectric Study of Phase Transitions in Cs3H(SeO4)2 and Its Isotope Effect

TL;DR: In this article, the dielectric constants along the c'axis of Cs 3 H(SeO 4 ) 2 and its deuterated crystal were measured in a temperature range from 5 K to 460 K.
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Dielectric Study of the Phase Transition in K3H(SeO4)2 and Isotope Effect

TL;DR: In this article, the dielectric constants of K 3 H(SeO 4 ) 2 and its partially deuterated crystal were measured from 5 K to 400 K, and it was found that the peak of the peak was shifted from 20 K to 73 K by deuteration of about 70%.