V
V. Senthilkumar
Researcher at Alagappa University
Publications - 5
Citations - 168
V. Senthilkumar is an academic researcher from Alagappa University. The author has contributed to research in topics: Thin film & Conductivity. The author has an hindex of 3, co-authored 5 publications receiving 152 citations.
Papers
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Journal ArticleDOI
Optoelectronic and electrochemical properties of nickel oxide (NiO) films deposited by DC reactive magnetron sputtering
Balasubramanian Subramanian,Mostafa M. Ibrahim,V. Senthilkumar,K. R. Murali,V.S. Vidhya,C. Sanjeeviraja,M. Jayachandran +6 more
TL;DR: The effect of annealing on the structural, microstructural, electrical and optical properties were studied by X-ray diffraction (XRD), atomic force microscope (AFM), four-probe resistivity measurement and UV-vis spectrophotometer as mentioned in this paper.
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Preparation of anatase TiO2 thin films for dye-sensitized solar cells by DC reactive magnetron sputtering technique
TL;DR: In this paper, anatase titanium dioxide (TiO2) thin films are prepared by DC reactive magnetron sputtering using Ti target as the source material, where argon and oxygen are used as sputtering and reactive gas respectively.
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Studies on transparent spinel magnesium indium oxide thin films prepared by chemical spray pyrolysis
A. Moses Ezhil Raj,V. Senthilkumar,V. Swaminathan,Joachim Wollschläger,M. Suendorf,M. Neumann,M. Jayachandran,C. Sanjeeviraja +7 more
TL;DR: In this article, metal organic chemical spray pyrolysis technique was used to obtain a single-phase magnesium indium oxide (MgIn2O4) films with Mg/In ratio 0.50, and the observed optical band gaps varied from 3.18 to 3.86 eV.
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Synthesis and characterization of spray pyrolysed MgIn2O4 spinel thin films for novel applications
A. Moses Ezhil Raj,Balasubramanian Subramanian,V. Senthilkumar,M. Jayachandran,C. Sanjeeviraja +4 more
TL;DR: A novel ternary oxide compound magnesium indate film, MgIn 2 O 4 (MIO), manifesting high transparency and conductivity has been prepared by spray pyrolysis technique.
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THE INFLUENCE OF SUBSTRATE TEMPERATURE ON THE ELECTRICAL PROPERTIES OF ZnO FILMS PREPARED BY THE RF MAGNETRON SPUTTERING TECHNIQUE
K. Saravanakumar,V. Senthilkumar,C. Sanjeeviraja,M. Jayachandran,V. Ganesan,Raushan B. Koizhaiganova,T. Vasudevan,Mu Sang Lee +7 more
TL;DR: In this article, ZnO thin films were grown by the RF magnetron sputtering technique at different substrate temperatures, from RT to 300°C, and the experimental results showed that the conductivity and carrier mobility of the films increased with increasing substrate temperature, which can be due to the grain-boundary-dominated conduction mechanism.