V
Vardaan Chawla
Researcher at Stanford University
Publications - 8
Citations - 452
Vardaan Chawla is an academic researcher from Stanford University. The author has contributed to research in topics: Thin film & CZTS. The author has an hindex of 5, co-authored 7 publications receiving 402 citations.
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Journal ArticleDOI
Investigating the role of grain boundaries in CZTS and CZTSSe thin film solar cells with scanning probe microscopy.
TL;DR: To understand what enables CIGS and CdTe solar cells to achieve their high efficiencies and whether CZTS and CZ TSSe have the same beneficial property, the aim of this paper is to understand why these materials perform better in the polycrystalline form rather than their single-crystal form.
Journal ArticleDOI
Reduced defect density at the CZTSSe/CdS interface by atomic layer deposition of Al2O3
TL;DR: In this article, the authors demonstrate the modification of the CZTSSe absorber/CdS buffer interface following the deposition of 1'nm-thick Al2O3 layers by atomic layer deposition (ALD) near room temperature.
Proceedings ArticleDOI
Effect of composition on high efficiency CZTSSe devices fabricated using co-sputtering of compound targets
Vardaan Chawla,Bruce M. Clemens +1 more
TL;DR: In this paper, the authors used sputter deposition to synthesize this material as a thin film and determine a composition window for growth of high efficiency CZTSSe devices using co-sputtering of compound targets.
Journal ArticleDOI
Interplay between surface preparation and device performance in CZTSSe solar cells: Effects of KCN and NH4OH etching
TL;DR: In this paper, the authors investigated NH4OH treatment and KCN etching as surface preparation methods for the absorber/CdS interface for two-stage processed CZTSSe and co-evaporated CZTSe absorber layers.
Proceedings ArticleDOI
Inexpensive, abundant, non-toxic thin films for solar cell applications grown by reactive sputtering
Vardaan Chawla,Bruce M. Clemens +1 more
TL;DR: In this article, a novel one-step deposition process where sulfur is incorporated into the film during deposition is presented, and the best of these films were incorporated into devices and efficiencies as high as 1.5% have been achieved.