W
Wei Wang
Researcher at Nanjing University of Science and Technology
Publications - 7
Citations - 74
Wei Wang is an academic researcher from Nanjing University of Science and Technology. The author has contributed to research in topics: Zernike polynomials & Orthogonal polynomials. The author has an hindex of 4, co-authored 7 publications receiving 60 citations.
Papers
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Journal ArticleDOI
Comparative assessment of orthogonal polynomials for wavefront reconstruction over the square aperture
TL;DR: Results show that the Numerical orthogonal polynomial is superior to the other three polynomials because of its high accuracy and robustness even in the case of a wavefront with incomplete data.
Journal ArticleDOI
Modal wavefront estimation from its slopes by numerical orthogonal transformation method over general shaped aperture.
Jingfei Ye,Wei Wang,Zhishan Gao,Liu Zhiying,Wang Shuai,Pablo Benítez,Juan C. Miñano,Qun Yuan +7 more
TL;DR: The performance of the numerical orthogonal transformation method is discussed, demonstrated and verified, indicating that the presented method is valid, accurate and easily implemented for wavefront estimation from its slopes.
Journal ArticleDOI
Modal wavefront reconstruction over general shaped aperture by numerical orthogonal polynomials
TL;DR: In this paper, the use of numerical orthogonal polynomials for reconstructing a wavefront with a general shaped aperture over the discrete data points is presented, and the results demonstrate the adaptability, validity, and accuracy of numerical Orthogonal Polynomial for estimating the wavefront over a general shape aperture from a regular boundary to an irregular boundary.
Patent
Optical heterogeneity measurement device and method based on dual wavelength fizeau interferometer
Gao Zhishan,Wang Kailiang,Cheng Jinlong,Wei Wang,Wang Shuai,Yuan Qun,Yang Zhongming,Zhu Dan,Jiantai Dou,Jingfei Ye +9 more
TL;DR: In this paper, an optical heterogeneity measurement device and method based on a dual wavelength fizeau interferometer is presented. But the measurement steps are simple, and the defects that the traditional absolute measurement method has tedious steps and is vulnerable to air disturbance are tackled
Patent
Bifocal wave zone plate interference microscopic-inspection apparatus for detecting flat mask defect
Gao Zhishan,Jiantai Dou,Ruoyan Wang,Song Huaqing,Yang Zhongming,Wang Shuai,Cheng Jinlong,Wang Kailiang,Wei Wang,Jingfei Ye,Yuan Qun +10 more
TL;DR: In this article, a bifocal wave zone plate interference microscopic-inspection apparatus for detecting flat mask defect is presented, where light passes through the aperture diaphragm to form a spot light source, and then passes through a positive lens to form parallel light, parallel light passes along the semi-reflecting and semi-transmitting spectroscope and realizes incidence on the Bifocal Wave Zone plate, 0-grade diffracted light satisfies a refraction principle.