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Wei Wang

Researcher at Nanjing University of Science and Technology

Publications -  7
Citations -  74

Wei Wang is an academic researcher from Nanjing University of Science and Technology. The author has contributed to research in topics: Zernike polynomials & Orthogonal polynomials. The author has an hindex of 4, co-authored 7 publications receiving 60 citations.

Papers
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Journal ArticleDOI

Comparative assessment of orthogonal polynomials for wavefront reconstruction over the square aperture

TL;DR: Results show that the Numerical orthogonal polynomial is superior to the other three polynomials because of its high accuracy and robustness even in the case of a wavefront with incomplete data.
Journal ArticleDOI

Modal wavefront estimation from its slopes by numerical orthogonal transformation method over general shaped aperture.

TL;DR: The performance of the numerical orthogonal transformation method is discussed, demonstrated and verified, indicating that the presented method is valid, accurate and easily implemented for wavefront estimation from its slopes.
Journal ArticleDOI

Modal wavefront reconstruction over general shaped aperture by numerical orthogonal polynomials

TL;DR: In this paper, the use of numerical orthogonal polynomials for reconstructing a wavefront with a general shaped aperture over the discrete data points is presented, and the results demonstrate the adaptability, validity, and accuracy of numerical Orthogonal Polynomial for estimating the wavefront over a general shape aperture from a regular boundary to an irregular boundary.
Patent

Optical heterogeneity measurement device and method based on dual wavelength fizeau interferometer

TL;DR: In this paper, an optical heterogeneity measurement device and method based on a dual wavelength fizeau interferometer is presented. But the measurement steps are simple, and the defects that the traditional absolute measurement method has tedious steps and is vulnerable to air disturbance are tackled
Patent

Bifocal wave zone plate interference microscopic-inspection apparatus for detecting flat mask defect

TL;DR: In this article, a bifocal wave zone plate interference microscopic-inspection apparatus for detecting flat mask defect is presented, where light passes through the aperture diaphragm to form a spot light source, and then passes through a positive lens to form parallel light, parallel light passes along the semi-reflecting and semi-transmitting spectroscope and realizes incidence on the Bifocal Wave Zone plate, 0-grade diffracted light satisfies a refraction principle.