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William Brent Carter
Researcher at Georgia Tech Research Institute
Publications - 9
Citations - 342
William Brent Carter is an academic researcher from Georgia Tech Research Institute. The author has contributed to research in topics: Hybrid physical-chemical vapor deposition & Deposition (phase transition). The author has an hindex of 6, co-authored 9 publications receiving 339 citations.
Papers
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Journal ArticleDOI
Combustion chemical vapor deposition: A novel thin‐film deposition technique
TL;DR: A new open-atmosphere chemical vapor deposition (CVD) technique has been developed that is termed combustion chemical vapor (CCVD) as mentioned in this paper, which provides the necessary environment for the deposition of a dense film whose elemental constituents are derived from solution, vapor, or gas sources.
Patent
Combustion chemical vapor deposition of films and coatings
TL;DR: In this article, a method for applying coatings to substrates using combustion chemical vapor deposition was proposed, which can be controlled so as to have a preferred orientation on the substrate.
Patent
Method for the combustion chemical vapor deposition of films and coatings
TL;DR: In this paper, a method for applying coatings to substrates using combustion chemical vapor deposition was proposed, which can be controlled so as to have a preferred orientation on the substrate.
Journal ArticleDOI
Rapid chemical vapor deposition of superconducting YBa2Cu3Ox
W. J. Lackey,William Brent Carter,John A. Hanigofsky,David N. Hill,E. Kent Barefield,Galina Neumeier,D.F. O'Brien,Michael J. Shapiro,John R. Thompson,Andrew J. Green,T. S. Moss,R. A. Jake,K. R. Efferson +12 more
TL;DR: In this article, a process was developed that enables the rapid chemical vapor deposition of superconducting YBa2Cu3Ox, which is pneumatically transported into the chemical vaporization furnace.
Patent
Method for the rapid deposition with low vapor pressure reactants by chemical vapor deposition
TL;DR: In this article, a method for applying coatings to substrates using chemical vapor deposition with low vapor pressure reagents is disclosed which comprises the steps of placing a substrate in a furnace means, directly introducing powder reagents by a powder feeder means into said furnace means; and vaporizing and reacting said reagents within the furnace means resulting in the deposition from the vapor phase of a coating on said substrate, wherein said coating can be an oxide superconductor.