scispace - formally typeset
Patent

Combustion chemical vapor deposition of films and coatings

Reads0
Chats0
TLDR
In this article, a method for applying coatings to substrates using combustion chemical vapor deposition was proposed, which can be controlled so as to have a preferred orientation on the substrate.
Abstract
A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method.

read more

Citations
More filters
Patent

Formation of thin film capacitors

TL;DR: In this paper, thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns, and a second flexible metal surface layer, which is either a metal foil, such as a copper, aluminum, or nickel foil, or a metal layer deposited on a polymeric support sheet.
Patent

Mixed-metal oxide particles by liquid feed flame spray pyrolysis of oxide precursors in oxygenated solvents

TL;DR: The pyrolysis of solutions of a metal oxide precursor which is an alkoxide or C1-6 carboxylate and at least one second metal oxide precursors and/or second metal compound dissolved in oxygenated solvent by combustion with oxygen lead to the formation of sub-micron mixed-metal oxide powders not accessible by other processes as discussed by the authors.
Patent

Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof

TL;DR: In this paper, a corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component.
Patent

Coating formation by reactive deposition

TL;DR: In this paper, a noncircular reactant inlet (682), optical elements forming a light path (684), a first substrate (680), and a motor connected to the apparatus are described.
Patent

Dense coating formation by reactive deposition

TL;DR: In this article, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam supplied via a light entry port, and the substrate may be moved relative to the flow, such as via arm, which translates substrate carrier through the product stream.
References
More filters
Journal ArticleDOI

Combustion chemical vapor deposition: A novel thin‐film deposition technique

TL;DR: A new open-atmosphere chemical vapor deposition (CVD) technique has been developed that is termed combustion chemical vapor (CCVD) as mentioned in this paper, which provides the necessary environment for the deposition of a dense film whose elemental constituents are derived from solution, vapor, or gas sources.
Journal ArticleDOI

The synthesis of high-quality diamond in combustion flames

TL;DR: In this paper, high quality diamond with good crystallinity has been successfully synthesized on a substrate using an oxy-acetylene combustion flame in the atmosphere, and the deposition rate of transparent diamond depended strongly on substrate temperatures and the O2/C2H2 ratio.
Patent

Chemically bonded diamond films and method for producing same

TL;DR: In this article, a carbon-based diamond-like film is made by ion beam deposition upon and chemically bonded to a substrate article, which is overgrown by a carbon layer that assumes the true diamond microstructure or, alternatively, a carbon structure which more closely approximates the micro-structure and physical, chemical and electrical properties of true diamond.
Patent

Method for preparing needle-like, fibrous or porous diamond, or an aggregate thereof

TL;DR: A method for preparing needle-like, fibrous or porous diamond, or an aggregate thereof, which comprises subjecting diamond synthesized by a chemical vapor deposition method or a plasma assisted vapor deposition (PAVD) method, or a film of such diamond, to plasma treatment in a gas stream containing oxygen, carbon dioxide, steam, hydrogen, a halogenated hydrocarbon or a halogeneated carbon, or to thermal oxidation treatment for etching as discussed by the authors.
Patent

Method for producing thin film of oxide superconductor

TL;DR: In this paper, a thin film of an oxide superconductor having a homogeneous composition and less oxygen defects is produced by independently vaporizing onto a substrate at least one material selected from the group consisting of the elements of Ia, IIa, and IIIa groups of the periodic table and their compounds and irradiating the substrate with oxygen ions and depositing the vaporized materials together with oxygen on the substrate to form the thin film.
Related Papers (5)