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William F. Reus
Researcher at Harvard University
Publications - 15
Citations - 1700
William F. Reus is an academic researcher from Harvard University. The author has contributed to research in topics: Monolayer & PEDOT:PSS. The author has an hindex of 14, co-authored 15 publications receiving 1511 citations.
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Journal ArticleDOI
Molecular Rectification in Metal−SAM−Metal Oxide−Metal Junctions
TL;DR: The ability of the experimental techniques described here to generate SAM-based junctions in high yield useful in physical-organic studies is demonstrated and statistical significance of the rectification ratios is demonstrated.
Journal ArticleDOI
Charge Transport and Rectification in Arrays of SAM-Based Tunneling Junctions
Christian A. Nijhuis,William F. Reus,Jabulani Randall Barber,Michael D. Dickey,George M. Whitesides +4 more
TL;DR: This paper describes a method of fabrication that generates small arrays of tunneling junctions based on self-assembled monolayers (SAMs) that enable the measurement of the electrical characteristics of the junctions as a function of chemical structure, voltage, and temperature over the range of 110-293 K.
Journal ArticleDOI
Mechanism of Rectification in Tunneling Junctions Based on Molecules with Asymmetric Potential Drops
TL;DR: A systematic physical-organic study reached the conclusion that only one energetically accessible molecular orbital (the HOMO of the Fc) is necessary to obtain large rectification ratios R ≈ 1.0 × 10(2) (R = |J(-V)|/|J(V)| at ±1 V).
Journal ArticleDOI
Odd-even effects in charge transport across self-assembled monolayers.
Martin M. Thuo,William F. Reus,Christian A. Nijhuis,Jabulani Randall Barber,Choongik Kim,Michael D. Schulz,George M. Whitesides +6 more
TL;DR: The observed difference in charge transport between n-alkanethiols with odd and even numbers of methylenes--the "odd-even effect"--is statistically discernible using these junctions and demonstrates that this technique is sensitive to small differences in the structure and properties of the SAM.
Journal ArticleDOI
Electrical Resistance of Ag-TS-S(CH2)(n-1)CH3//Ga2O3/EGaln Tunneling Junctions
Ludovico Cademartiri,Martin M. Thuo,Christian A. Nijhuis,William F. Reus,Simon Tricard,Jabulani Randall Barber,Rana N.S. Sodhi,Peter M. Brodersen,Choongik Kim,Ryan C. Chiechi,George M. Whitesides +10 more
TL;DR: In this article, a combination of structural, chemical, and electrical characterizations leads to four conclusions about AgTS-S(CH2)n−1CH3/Ga2O3/EGaIn junctions.