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Xiaojun Li
Researcher at Chinese Academy of Sciences
Publications - 6
Citations - 141
Xiaojun Li is an academic researcher from Chinese Academy of Sciences. The author has contributed to research in topics: Fabrication & Ultrasonic sensor. The author has an hindex of 4, co-authored 6 publications receiving 129 citations.
Papers
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Journal ArticleDOI
A novel fabrication process of MEMS devices on polyimide flexible substrates
TL;DR: In this article, a spin-coated liquid polyimide substrate instead of solid polyimides sheet is employed to reduce the thermal cycling and improve the production yield of the temperature sensor array.
Journal ArticleDOI
Fabrication of size controllable SU-8 nanochannels using nanoimprint lithography and low-pressure thermal bonding methods
Xiaojun Li,Hui You,Hai Jiang,Lin Ronghui,Kong Deyi,Jiang Rui,Zhu Likai,Jun Gao,Tang Min,Xudi Wang,Shaojun Fu +10 more
TL;DR: In this article, a new and simple method is demonstrated to achieve size controllable nanochannels by using nanoimprint lithography and low-pressure thermal bonding methods, and the simple geometrical argument shows that the height of the enclosed nanochannel can be determined by the depth of the cross-linked SU-8 trenches as well as by the initial thickness of the thin unexposed SU -8 layer.
Patent
Flexible focusing MEMS ultrasonic generator and preparation method thereof
TL;DR: In this paper, a flexible focusing MEMS ultrasonic generator is proposed, where ultrasonic transducers are concavely embedded in the polyimide matrix in the shape of a bowl.
Journal ArticleDOI
Nano/microchannel fabrication based on SU-8 using sacrificial resist etching method
TL;DR: In this paper, a new etching method for the fabrication of nano/microfluidic channels based on SU-8 using AZ1350 as a sacrificial resist was proposed.
Journal ArticleDOI
Fabrication of size-controllable nanofluidic channels using angled physical vapor deposition
TL;DR: In this paper, the authors demonstrate a new and simple method to achieve ultrasmall nanochannels downing size to about 50nm with well-controlled dimensions in large area by using NIL and angled physical vapor deposition (PVD).