Yubao Wang

TL;DR: In this article, the silicon doped hydrogenated amorphous carbon (a-C:H:Si) films were prepared on silicon substrates by middle-frequency magnetron sputtering silicon target in an argon and methane gas mixture atmosphere.

TL;DR: In this paper, the diamond-like carbon films have been prepared by the strategy of the glancing angle deposition using unbalanced magnetron sputtering technique, which is found that the structure and the residual stress of the films are strongly dependent on the deposition angle.

TL;DR: In this article, the effects of substrate rotation on the microstructure, surface morphology, internal stress and mechanical properties of the a-C:H films were investigated, and it was shown that substrate rotation plays an important role in the growth of the films, and the structural changes induced by the substrate rotation are discussed in terms of subplantation and migration roles of incident species.

TL;DR: In this article, the influence of the applied bias voltage on the composition, surface morphology, structure, and mechanical properties of a-C:H films was investigated by XPS, AFM, Raman, FTIR spectroscopy, and nanoindenter.

TL;DR: In this paper, the a-C and a-c:H films are deposited on silicon surfaces modified with and without nickel nanoparticles by using mid-frequency magnetron sputtering and the microstructures and morphologies of the films are analyzed by Raman spectroscopy and atomic force microscopy.