正
正男 牛田
Publications - 13
Citations - 161
正男 牛田 is an academic researcher. The author has contributed to research in topics: Phase-shift mask & Layer (electronics). The author has an hindex of 7, co-authored 13 publications receiving 161 citations.
Papers
More filters
Patent
Method for producing halftone phase shifting mask blank
TL;DR: In this paper, a method for adjusting the wavelength dependence of reflectance of the light shielding film in a halftone phase shift mask blank having on a transparent substrate 1 a translucent film 2 having a prescribed transmittance and phase shifting extent to exposure light and the light shield film 3 formed on on the translucent film2, the top layer part of the LSH film 3 is formed as a reflectance adjustment part 3a comprising chromium, carbon, oxygen, and nitrogen.
Patent
Photomask blank and photomask
TL;DR: In this paper, a chromium carbide, chromium nitride and chromium oxide was incorporated into an antireflection film to prevent the degradation in sectional shape at the time of overetching.
Patent
Halftone type phase shift mask blank and method of manufacturing halftone type phase shift mask blank
TL;DR: In this paper, the halftone type phase shift mask blank is used to improve the dimensional accuracy of the mask pattern by using a blank having a laminated structure of the haloftone material film and a light shielding film.
Patent
Photomask blank, photomask and method for manufacturing the same
TL;DR: In this paper, the authors proposed a photomask blank consisting of a light shielding film containing an antireflection film, which is formed on a transparent substrate and has a layered structure of a first light-shielding film made of chromium nitride and a second light-healing film made with chromium carbide.
Patent
Method for manufacturing phase shift mask blank and phase shift mask
TL;DR: In this article, the phase shift mask blank contains oxygen in the optical semi-transmission film composed mainly of nitrogen, metal, and silicon within the range of maintaining the optical characteristics of the optical design.