Patent
Lithographic systems and methods with extended depth of focus
TLDR
An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresists as discussed by the authors.Abstract:
An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.read more
Citations
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Patent
Extended depth of field optical systems
W. T. Cathey,Edward R. Dowski +1 more
TL;DR: In this paper, a special purpose optical mask was designed to cause the optical transfer function to remain essentially constant within some range from the in-focus position, resulting in an infocus image over an increased depth of field.
Patent
Extended Depth of Field Using a Multi-Focal Length Lens with a Controlled Range of Spherical Aberration and a Centrally Obscured Aperture
Nicholas George,Wanli Chi +1 more
TL;DR: In this paper, a computational imaging system that combines a multifocal imaging subsystem for producing a purposefully blurred intermediate image with a digital processing subsystem for recovering a recovered image having an extended depth of field is achieved.
Patent
End-to-end design of superresolution electro-optic imaging systems
TL;DR: A superresolution electro-optic imaging system operates in a manner that takes into account the different subsystems for subsequent superresolution processing and/or reduces aliasing effects.
Patent
Imaging lens system
TL;DR: In this article, an imaging lens system including a first lens with positive refractive power having a convex object-side surface, a second lens with negative refractive powers, a third lens having a concave image side surface and an aperture stop disposed between an imaged object and the third lens was presented.
Patent
Mechanically-adjustable optical phase filters for modifying depth of field, aberration-tolerance, anti-aliasing in optical systems
TL;DR: An optical system with mechanical adjustment provides for the rotation and/or translation of one or more optical phase filters to variably select an extended depth of field, aberration-tolerance, and anti-aliasing properties of an optical imaging system as discussed by the authors.
References
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Journal ArticleDOI
Extended depth of field through wave-front coding
TL;DR: An optical-digital system that delivers near-diffraction-limited imaging performance with a large depth of field that is the standard incoherent optical system modified by a phase mask with digital processing of the resulting intermediate image.
Patent
Optical scanner for reading and decoding one- and-two-dimensional symbologies at variable depths of field including memory efficient high speed image processing means and high accuracy image analysis means
TL;DR: An optical device for reading one-and two-dimensional symbologies at variable depths of field is described in this paper, where a light source for projecting emitted light toward the symbol image to be reflected back to an optical assembly, or zoom lens.
Book
Principles of Lithography
TL;DR: The second edition of this book as discussed by the authors was written to address several needs, and the revisions for the second edition were made with those original objectives in mind, and many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail.
Patent
High-efficiency, multilevel, diffractive optical elements
TL;DR: In this article, a photoresist layer on an optical element substrate is exposed through the first mask and then etched, and the process is repeated for the second and subsequent masks to create a multistep configuration.
Journal ArticleDOI
Optical and Interferometric Lithography - Nanotechnology Enablers
TL;DR: Interferometric lithography (IL), the interference of a small number of coherent optical beams, is a powerful technique for the fabrication of a wide array of samples of interest for nanoscience and nanotechnology.